SCHEMBL13027448

SCHEMBL13027448

COc1cc(CC[Si](OC)(OC)OC)cc(OC)c1

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ CYP19A1 P11511 1/20 0.50
▸ ALDH1A1 P00352 2/20 0.48
▸ CALM1 P0DP23 4/20 0.47
▸ AKR1B1 P15121 1/20 0.47
▸ FGFR1 P11362 1/20 0.42
▸ KDR P35968 1/20 0.42
▸ DAO P14920 1/20 0.42
▸ PTGS2 P35354 1/20 0.42
▸ GABRA1 P14867 1/20 0.41
▸ GABRG2 P18507 1/20 0.41
▸ GABRB3 P28472 1/20 0.41
▸ GABRA3 P34903 1/20 0.41
▸ GABRA2 P47869 1/20 0.41
▸ GABRB2 P47870 1/20 0.41
▸ CNR1 P21554 1/20 0.39
▸ CYP1A1 P04798 2/20 0.38
▸ CYP1B1 Q16678 2/20 0.38
▸ TSHR P16473 1/20 0.38
▸ PTPN1 P18031 1/20 0.38
▸ NOS2 P35228 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13027400 0.88 CYP19A1 (0.41) CYP19A1ALDH1A1CALM1AKR1B1FGFR1
SCHEMBL13027659 0.85 CYP19A1 (0.39) CYP19A1ALDH1A1CALM1AKR1B1FGFR1
SCHEMBL15672338 0.84 CALM1 (0.45) CYP19A1ALDH1A1CALM1AKR1B1FGFR1
SCHEMBL13027602 0.81 CYP19A1 (0.42) CYP19A1ALDH1A1CALM1AKR1B1FGFR1
SCHEMBL9491787 0.81 CYP19A1 (0.68) CYP19A1ALDH1A1CALM1AKR1B1FGFR1
SCHEMBL13027479 0.80 TAAR1 (0.62) —
SCHEMBL13027273 0.80 ALDH1A1 (0.50) CYP19A1ALDH1A1CALM1AKR1B1FGFR1
SCHEMBL28665235 0.79 CYP19A1 (0.47) CYP19A1ALDH1A1CALM1AKR1B1FGFR1
SCHEMBL13027474 0.78 TAAR1 (0.57) CALM1
SCHEMBL13027392 0.78 KMT2A (0.34) CYP19A1CNR1TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8697330-B2 Composition for forming a silicon-containing antireflection film, substrate having the silicon-containing antireflection film from the composition and patterning process using the same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-04-15 — — US disclosed
US-20100285407-A1 Composition for forming a silicon-containing antireflection film, substrate having the silicon-containing antireflection film from the composition and patterning process using the same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2010-11-11 — — US disclosed
Send feedback