Predicted protein targets (top 16)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SCN8A | Q9UQD0 | 1/20 | 0.32 |
| ▸ | MEN1 | O00255 | 1/20 | 0.31 |
| ▸ | LMNA | P02545 | 1/20 | 0.31 |
| ▸ | MAPT | P10636 | 1/20 | 0.31 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.31 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.31 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.31 |
| ▸ | CA12 | O43570 | 1/20 | 0.31 |
| ▸ | CA1 | P00915 | 1/20 | 0.31 |
| ▸ | CA2 | P00918 | 1/20 | 0.31 |
| ▸ | CA14 | Q9ULX7 | 1/20 | 0.31 |
| ▸ | PTGER1 | P34995 | 1/20 | 0.30 |
| ▸ | PTGER4 | P35408 | 1/20 | 0.30 |
| ▸ | PTGER3 | P43115 | 1/20 | 0.30 |
| ▸ | PTGER2 | P43116 | 1/20 | 0.30 |
| ▸ | ABCB1 | P08183 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13027620 | 0.87 | AOC3 (0.32) | LMNAMAPT | |
| SCHEMBL13027611 | 0.85 | CA12 (0.45) | CA12CA1CA2CA14ABCB1 | |
| SCHEMBL13027421 | 0.84 | SCN8A (0.36) | SCN8AMEN1LMNAMAPTKMT2A | |
| SCHEMBL13027501 | 0.83 | P2RX7 (0.34) | MEN1LMNAMAPTKMT2AHSD17B10 | |
| SCHEMBL13027502 | 0.83 | TAAR1 (0.44) | MEN1MAPTKMT2ACA12CA1 | |
| SCHEMBL13027550 | 0.82 | — | — | |
| SCHEMBL13027524 | 0.82 | — | — | |
| SCHEMBL13027539 | 0.82 | — | — | |
| SCHEMBL13027497 | 0.81 | TAAR1 (0.31) | — | |
| SCHEMBL13027540 | 0.79 | LMNA (0.32) | LMNAMAPTHSD17B10CA12CA1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20100285407-A1 | Composition for forming a silicon-containing antireflection film, substrate having the silicon-containing antireflection film from the composition and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-11-11 | — | — | US | disclosed |