SCHEMBL13027428

SCHEMBL13027428

COc1cccc(C)c1CC[Si](OC)(OC)OC

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ CA12 O43570 1/20 0.37
▸ CA1 P00915 1/20 0.37
▸ CA2 P00918 1/20 0.37
▸ CA4 P22748 1/20 0.37
▸ CA7 P43166 1/20 0.37
▸ CA9 Q16790 1/20 0.37
▸ CA14 Q9ULX7 1/20 0.37
▸ LMNA P02545 3/20 0.37
▸ MAPT P10636 3/20 0.37
▸ PKM P14618 2/20 0.37
▸ NPC1 O15118 1/20 0.37
▸ POLB P06746 1/20 0.37
▸ G6PD P11413 1/20 0.37
▸ NQO2 P16083 1/20 0.37
▸ RAB9A P51151 1/20 0.37
▸ SMN1; SMN2 Q16637 1/20 0.36
▸ HSD17B10 Q99714 2/20 0.35
▸ KDM4E B2RXH2 2/20 0.35
▸ GAA P10253 1/20 0.35
▸ ALDH1A1 P00352 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13027385 0.89 TAAR1 (0.34) CA1CA2CA7CA9LMNA
SCHEMBL13027460 0.89 CA1 (0.42) CA12CA1CA2CA4CA7
SCHEMBL15672353 0.87 KDM4E (0.35) CA12CA1CA2CA4CA7
SCHEMBL13027540 0.84 LMNA (0.32) CA12CA1CA2CA4CA7
SCHEMBL13027251 0.84 CA12 (0.38) CA12CA1CA2CA4CA7
SCHEMBL13027655 0.81 SMN1; SMN2 (0.39) CA12CA1CA2CA4CA7
SCHEMBL4961769 0.79 ALOX5 (0.42) CA12CA1CA2CA4CA7
SCHEMBL13027651 0.79 NPBWR1 (0.32) LMNAMAPTHSD17B10
SCHEMBL13027377 0.79 TAAR1 (0.42) CA12CA1CA2CA4CA7
SCHEMBL13027426 0.79 KDM4E (0.32) LMNAMAPTPKMPOLBSMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8697330-B2 Composition for forming a silicon-containing antireflection film, substrate having the silicon-containing antireflection film from the composition and patterning process using the same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-04-15 — — US disclosed
US-20100285407-A1 Composition for forming a silicon-containing antireflection film, substrate having the silicon-containing antireflection film from the composition and patterning process using the same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2010-11-11 — — US disclosed
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