⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13027620 | 0.90 | AOC3 (0.32) | — | |
| SCHEMBL13027524 | 0.88 | — | — | |
| SCHEMBL13027519 | 0.84 | — | — | |
| SCHEMBL13027423 | 0.84 | AOC3 (0.33) | — | |
| SCHEMBL13027547 | 0.82 | SCN8A (0.32) | — | |
| SCHEMBL13027539 | 0.82 | — | — | |
| SCHEMBL13027600 | 0.81 | AOC3 (0.48) | — | |
| SCHEMBL13027492 | 0.80 | — | — | |
| SCHEMBL13027536 | 0.79 | — | — | |
| SCHEMBL15672333 | 0.79 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20100285407-A1 | Composition for forming a silicon-containing antireflection film, substrate having the silicon-containing antireflection film from the composition and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-11-11 | — | — | US | disclosed |