SCHEMBL13027620

SCHEMBL13027620

C#CO[Si](CCc1ccc(C)c(OC)c1OC)(OC#C)OC#C

nearest known ligand 0.32

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
▸ AOC3 Q16853 1/20 0.32
▸ ALDH1A1 P00352 1/20 0.31
▸ LMNA P02545 1/20 0.31
▸ MAPT P10636 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13027550 0.90 — —
SCHEMBL13027524 0.90 — —
SCHEMBL13027547 0.87 SCN8A (0.32) LMNAMAPT
SCHEMBL13027539 0.86 — —
SCHEMBL13027600 0.85 AOC3 (0.48) AOC3ALDH1A1LMNAMAPT
SCHEMBL13027476 0.84 AOC3 (0.37) AOC3ALDH1A1LMNAMAPT
SCHEMBL13027519 0.80 — —
SCHEMBL15672361 0.78 AOC3 (0.33) AOC3ALDH1A1LMNAMAPT
SCHEMBL13027611 0.78 CA12 (0.45) ALDH1A1
SCHEMBL13027556 0.78 ADRA1A (0.36) AOC3ALDH1A1LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20100285407-A1 Composition for forming a silicon-containing antireflection film, substrate having the silicon-containing antireflection film from the composition and patterning process using the same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2010-11-11 — — US disclosed
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