SCHEMBL13027524

SCHEMBL13027524

C#CO[Si](CCc1ccc(C)c(OC)c1C)(OC#C)OC#C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13027620 0.90 AOC3 (0.32) —
SCHEMBL13027550 0.88 — —
SCHEMBL13027539 0.85 — —
SCHEMBL13027519 0.84 — —
SCHEMBL13027409 0.84 AGXT (0.33) —
SCHEMBL13027547 0.82 SCN8A (0.32) —
SCHEMBL15672402 0.79 AGXT (0.30) —
SCHEMBL13027600 0.78 AOC3 (0.48) —
SCHEMBL13027501 0.77 P2RX7 (0.34) —
SCHEMBL13027556 0.77 ADRA1A (0.36) —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20100285407-A1 Composition for forming a silicon-containing antireflection film, substrate having the silicon-containing antireflection film from the composition and patterning process using the same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2010-11-11 — — US disclosed
Send feedback