SCHEMBL13027755

SCHEMBL13027755

COc1cccc([Si](OC)(OC)OC)c1C[Si](OC)(OC)OC

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ SMN1; SMN2 Q16637 2/20 0.39
▸ CA12 O43570 2/20 0.35
▸ CA1 P00915 2/20 0.35
▸ CA2 P00918 2/20 0.35
▸ CA7 P43166 2/20 0.35
▸ CA9 Q16790 2/20 0.35
▸ CA14 Q9ULX7 2/20 0.35
▸ CA4 P22748 1/20 0.35
▸ MCHR1 Q99705 1/20 0.34
▸ LMNA P02545 3/20 0.33
▸ MAPK1 P28482 2/20 0.33
▸ MAPT P10636 2/20 0.33
▸ KDM4E B2RXH2 2/20 0.33
▸ ALDH1A1 P00352 1/20 0.33
▸ TP53 P04637 1/20 0.33
▸ CYP3A4 P08684 1/20 0.33
▸ HPGD P15428 1/20 0.33
▸ ALOX15 P16050 1/20 0.33
▸ ALOX12 P18054 1/20 0.33
▸ HSD17B10 Q99714 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13027655 0.86 SMN1; SMN2 (0.39) SMN1; SMN2CA12CA1CA2CA7
SCHEMBL13027274 0.85 CA1 (0.44) SMN1; SMN2CA12CA1CA2CA7
SCHEMBL13027745 0.81 TAAR1 (0.31) LMNACYP3A4
SCHEMBL13027777 0.79 SMN1; SMN2 (0.33) SMN1; SMN2CA12CA1CA2CA7
SCHEMBL13027251 0.79 CA12 (0.38) SMN1; SMN2CA12CA1CA2CA7
SCHEMBL13027275 0.74 ALDH1A1 (0.37) SMN1; SMN2MAPK1MAPTKDM4EALDH1A1
SCHEMBL13027720 0.74 KDM4E (0.31) SMN1; SMN2MAPK1KDM4EALDH1A1
SCHEMBL13027131 0.74 SMN1; SMN2 (0.47) SMN1; SMN2CA12CA1CA2CA7
SCHEMBL1971497 0.73 CA1 (0.55) SMN1; SMN2CA12CA1CA2CA7
SCHEMBL13027738 0.72 SMN1; SMN2 (0.39) SMN1; SMN2CA12CA1CA2CA7

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8697330-B2 Composition for forming a silicon-containing antireflection film, substrate having the silicon-containing antireflection film from the composition and patterning process using the same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-04-15 — — US disclosed
US-20100285407-A1 Composition for forming a silicon-containing antireflection film, substrate having the silicon-containing antireflection film from the composition and patterning process using the same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2010-11-11 — — US disclosed
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