Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.34 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.34 |
| ▸ | ACHE | P22303 | 1/20 | 0.31 |
| ▸ | LMNA | P02545 | 2/20 | 0.31 |
| ▸ | MAPT | P10636 | 2/20 | 0.31 |
| ▸ | GAA | P10253 | 1/20 | 0.31 |
| ▸ | TSHR | P16473 | 1/20 | 0.31 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.31 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.31 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13027743 | 0.86 | TAAR1 (0.32) | ACHELMNAMAPTGAATSHR | |
| SCHEMBL13027686 | 0.83 | ACHE (0.33) | ALDH1A1KDM4EACHELMNAMAPT | |
| SCHEMBL13027742 | 0.81 | APLNR (0.39) | ALDH1A1 | |
| SCHEMBL730220 | 0.80 | ALDH1A1 (0.35) | ALDH1A1KDM4EACHELMNAMAPT | |
| SCHEMBL7165863 | 0.80 | TAAR1 (0.36) | ALDH1A1KDM4EACHELMNAMAPT | |
| SCHEMBL13027231 | 0.79 | KDM4E (0.44) | ALDH1A1KDM4EACHELMNAMAPT | |
| SCHEMBL13027244 | 0.76 | ACHE (0.50) | ALDH1A1KDM4EACHELMNAMAPT | |
| SCHEMBL13027766 | 0.76 | — | — | |
| SCHEMBL13027229 | 0.76 | TAAR1 (0.47) | ALDH1A1KDM4EACHELMNAMAPT | |
| SCHEMBL13027790 | 0.74 | ACHE (0.39) | ALDH1A1ACHETDP1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8697330-B2 | Composition for forming a silicon-containing antireflection film, substrate having the silicon-containing antireflection film from the composition and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-04-15 | — | — | US | disclosed |
| US-20100285407-A1 | Composition for forming a silicon-containing antireflection film, substrate having the silicon-containing antireflection film from the composition and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-11-11 | — | — | US | disclosed |