⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL274229 | 0.92 | — | — | |
| SCHEMBL7112646 | 0.78 | — | — | |
| SCHEMBL8758399 | 0.77 | ALDH1A1 (0.31) | — | |
| SCHEMBL1303234 | 0.77 | — | — | |
| Sulfuric Acid SCHEMBL28057138 | 0.77 | CYP2C19 (0.30) | — | |
| SCHEMBL110522 | 0.76 | — | — | |
| Ethylene Glycol SCHEMBL5805748 | 0.75 | CYP2C19 (0.33) | — | |
| SCHEMBL65357 | 0.75 | — | — | |
| SCHEMBL271099 | 0.75 | — | — | |
| Ethylene Glycol SCHEMBL20544240 | 0.74 | CYP2C19 (0.35) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 50 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20260035596-A1 | COMPOSITIONS FOR POLISHING SUBSTRATES | ENTEGRIS INC (US) | 2026-02-05 | — | — | US | disclosed |
| US-20230151138-A1 | STEREOISOMER OF EPOXY COMPOUND, CURABLE COMPOSITION CONTAINING THE SAME, AND CURED PRODUCT OBTAINED BY CURING CURABLE COMPOSITION | ENEOS CORPORATION (JP) | 2023-05-18 | — | — | US | disclosed |
| EP-4130087-A1 | STEREOISOMER OF EPOXY COMPOUND, CURABLE COMPOSITION CONTAINING SAME, AND CURED OBJECT OBTAINED BY CURING CURABLE COMPOSITION | ENEOS Corporation (JP) | 2023-02-08 | — | — | EP | disclosed |
| CN-115279768-A | Stereoisomer of epoxy compound, curable composition containing same, and cured product obtained by curing curable composition | 引能仕株式会社 | 2022-11-01 | — | — | CN | disclosed |
| EP-4071182-A1 | ALICYCLIC ACRYLATE COMPOUND, ALICYCLIC EPOXY ACRYLATE COMPOUND, CURABLE COMPOSITION, AND CURED ARTICLE | ENEOS Corporation (JP) | 2022-10-12 | — | — | EP | disclosed |
| CN-114746392-A | Alicyclic acrylate compound, alicyclic epoxy acrylate compound, curable composition, and cured product | 引能仕株式会社 | 2022-07-12 | — | — | CN | disclosed |
| US-11384257-B2 | Chemical-mechanical polishing composition, rinse composition, chemical-mechanical polishing method, and rinsing method | CMC MATERIALS KK | 2022-07-12 | — | — | US | disclosed |
| US-20220204687-A1 | A CURABLE COMPOSITION AND A CURED PRODUCT THEREOF | ENEOS CORPORATION (JP) | 2022-06-30 | — | — | US | disclosed |
| EP-3954723-A1 | CURABLE COMPOSITION AND CURED PRODUCT OF SAME | ENEOS Corporation (JP) | 2022-02-16 | — | — | EP | disclosed |
| CN-113646354-A | Curable composition and cured product thereof | 引能仕株式会社 | 2021-11-12 | — | — | CN | disclosed |
| EP-1657268-B1 | PHOTOSENSITIVE COMPOSITION AND CURED PRODUCT THEREOF | ASAHI KASEI CHEMICALS CORP (JP) | 2015-05-27 | — | — | EP | disclosed |
| WO-2014174365-A2 | SLURRY COMPOSITION AND METHOD OF SUBSTRATE POLISHING | NIHON CABOT MICROELECTRONICS K.K. (JP) | 2014-10-30 | — | — | WO | disclosed |
| US-8859642-B2 | Curable composition, cured article obtained therefrom and process for preparation of the same | KANEKA CORPORATION (JP) | 2014-10-14 | — | — | US | disclosed |
| EP-2388280-A1 | CURABLE COMPOSITION, CURED OBJECT OBTAINED THEREFROM, AND PROCESS FOR PRODUCING SAME | Kaneka Corporation (JP) | 2011-11-23 | — | — | EP | disclosed |
| US-20110269894-A1 | CURABLE COMPOSITION, CURED ARTICLE OBTAINED THEREFROM AND PROCESS FOR PREPARATION OF THE SAME | KANEKA CORPORATION (JP) | 2011-11-03 | — | — | US | disclosed |
| US-8038733-B2 | Composition and system for hair coloring and color retention | FAROUK SYSTEMS, INC. (US) | 2011-10-18 | — | — | US | disclosed |
| US-7569260-B2 | Photosensitive composition and cured products thereof | ASAHI KASEI CHEMICALS CORPORATION (JP) | 2009-08-04 | — | — | US | disclosed |
| US-20060222999-A1 | Photosensitive composition and cured products thereof | ASAHI KASEI CHEMICALS CORPORATION (JP) | 2006-10-05 | — | — | US | disclosed |
| EP-1657268-A1 | PHOTOSENSITIVE COMPOSITION AND CURED PRODUCT THEREOF | Asahi Kasei Chemicals Corporation (JP) | 2006-05-17 | — | — | EP | disclosed |
| US-6235358-B1 | COATING LAYERS OF EPOXY RESINS AND PHOTOCATIONIC CURING CATALTST WITH CATIONIC SULFUR ESTERS, SENSITIZERS OF THIOXANTHONES AND TITANIUM DIOXIDE PIGMENTS | TOYO SEIKAN KAISHA, LTD. (JP) | 2001-05-22 | — | — | US | disclosed |