SCHEMBL13052215

SCHEMBL13052215

CC(C)OCCOc1ccc([S+](c2ccccc2)c2ccccc2)cc1

nearest known ligand 0.42

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
HPGD P15428 1/20 0.42
LTA4H P09960 4/20 0.40
KCNA3 P22001 1/20 0.39
PKM P14618 2/20 0.39
RAB9A P51151 2/20 0.38
MAPT P10636 1/20 0.38
LMNA P02545 1/20 0.37
HTR1D P28221 1/20 0.37
HTR1B P28222 1/20 0.37
PARP10 Q53GL7 1/20 0.37
SIGMAR1 Q99720 1/20 0.36
NPC1 O15118 1/20 0.36
POLB P06746 1/20 0.36
CTDSP1 Q9GZU7 1/20 0.36
L3MBTL1 Q9Y468 1/20 0.36
ATM Q13315 1/20 0.36
TAAR1 Q96RJ0 1/20 0.36
ALDH1A1 P00352 1/20 0.36
RECQL P46063 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10261592 0.86 KCNA3 (0.52) LTA4HKCNA3PKMRAB9AMAPT
SCHEMBL13052211 0.85 MAOA (0.39) HPGDLTA4HMAPTLMNASIGMAR1
SCHEMBL13131063 0.84 LTA4H (0.39) LTA4HKCNA3PKMRAB9AMAPT
SCHEMBL6564405 0.84 KCNA3 (0.56) HPGDLTA4HKCNA3PKMRAB9A
SCHEMBL14118641 0.81 LSS (0.54) HPGDLTA4HRAB9AMAPTNPC1
SCHEMBL11692748 0.81 LTA4H (0.61) LTA4HKCNA3PKM
SCHEMBL425903 0.79 LTA4H (0.63) LTA4HKCNA3LMNAALDH1A1
SCHEMBL3212615 0.79 LTA4H (0.63) LTA4HKCNA3LMNAALDH1A1
SCHEMBL6560429 0.79 KCNA3 (0.50) LTA4HKCNA3PKMLMNAHTR1D
SCHEMBL13052218 0.78 SCN4A (0.38) MAPTLMNAL3MBTL1ATMALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8298748-B2 Positive resist composition, method of forming resist pattern, and polymeric compound TOKYO OHKA KOGYO CO., LTD. (JP) 2012-10-30 US disclosed
US-20100297560-A1 POSITIVE RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND POLYMERIC COMPOUND TOKYO OHKA KOGYO CO., LTD. (JP) 2010-11-25 US disclosed