SCHEMBL13112795

SCHEMBL13112795

CC(=O)Oc1c(C)cc(-[s+]2c3ccccc3c3ccccc32)cc1C

nearest known ligand 0.55

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 5/20 0.55
GAA P10253 3/20 0.55
HTT P42858 2/20 0.55
HSD17B10 Q99714 2/20 0.55
TP53 P04637 1/20 0.55
MAPT P10636 1/20 0.55
BACE1 P56817 2/20 0.42
ALDH1A1 P00352 3/20 0.40
HPGD P15428 1/20 0.40
LMNA P02545 2/20 0.39
NPSR1 Q6W5P4 1/20 0.36
ELANE P08246 1/20 0.36
CYP3A4 P08684 1/20 0.36
ACHE P22303 1/20 0.36
SLC22A6 Q4U2R8 1/20 0.36
GLA P06280 2/20 0.35
TOP1 P11387 1/20 0.35
SMN1; SMN2 Q16637 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2611735 0.82 SMN1; SMN2 (0.38) KDM4EGAAHTTHSD17B10TP53
SCHEMBL98171 0.79 KDM4E (0.43) KDM4EGAAHTTHSD17B10TP53
SCHEMBL12133561 0.76 HSD17B10 (0.36) KDM4EGAAHTTHSD17B10TP53
SCHEMBL98365 0.75 LMNA (0.47) GAAHTTMAPTALDH1A1LMNA
SCHEMBL30434021 0.72 HTT (0.67) KDM4EGAAHTTHSD17B10TP53
SCHEMBL20398637 0.72 HTT (0.67) KDM4EGAAHTTHSD17B10TP53
SCHEMBL13112789 0.71 HTR1A (0.32)
SCHEMBL3597080 0.71 MAPT (1.00) KDM4EGAAHTTHSD17B10TP53
Acetomenaphthone SCHEMBL209382 0.71 HTT (1.00) KDM4EGAAHTTHSD17B10TP53
Acetomenaphthone SCHEMBL29411342 0.71 HTT (1.00) KDM4EGAAHTTHSD17B10TP53

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7807329-B2 Photosensitive composition and pattern-forming method using the same FUJIFILM CORPORATION (JP) 2010-10-05 US disclosed
US-20070072117-A1 Positive resist composition and pattern forming method using the same FUJI PHOTO FILM CO., LTD. 2007-03-29 US disclosed