⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL133874 | 0.97 | CYP19A1 (0.30) | — | |
| SCHEMBL4675178 | 0.97 | CYP19A1 (0.30) | — | |
| SCHEMBL4671938 | 0.97 | CYP19A1 (0.30) | — | |
| SCHEMBL622611 | 0.94 | — | — | |
| SCHEMBL197020 | 0.88 | — | — | |
| SCHEMBL9052834 | 0.73 | CYP19A1 (0.33) | — | |
| SCHEMBL11202509 | 0.72 | — | — | |
| SCHEMBL645146 | 0.71 | CYP19A1 (0.36) | — | |
| SCHEMBL5158861 | 0.70 | ALDH1A1 (0.35) | — | |
| SCHEMBL1448141 | 0.70 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1089 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230350296-A1 | CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-11-02 | — | — | US | claimed |
| US-20230288801-A1 | RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-09-14 | — | — | US | claimed |
| US-20230288804-A1 | CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-09-14 | — | — | US | claimed |
| CN-116736633-A | Resist material and pattern forming method | 信越化学工业株式会社 | 2023-09-12 | — | — | CN | claimed |
| EP-2788353-B1 | CAGE AMINE LIGANDS FOR METALLO-RADIOPHARMACEUTICALS | Clarity Pharmaceuticals Ltd (AU) | 2022-05-18 | — | — | EP | claimed |
| US-10509314-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2019-12-17 | — | — | US | claimed |
| US-10126647-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-11-13 | — | — | US | claimed |
| US-20170108774-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-04-20 | — | — | US | claimed |
| US-20170075217-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-03-16 | — | — | US | claimed |
| US-20170075218-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-03-16 | — | — | US | claimed |
| EP-1299352-A2 | COMPOUNDS TO TREAT ALZHEIMER'S DISEASE | Elan Pharmaceuticals, Inc. (US) | 2003-04-09 | — | — | EP | claimed |
| US-20030013881-A1 | Compounds to treat Alzheimer's disease | ELAN PHARMACEUTICALS, INC. | 2003-01-16 | — | — | US | claimed |
| US-20020128255-A1 | Compounds to treat alzheimer's disease | PHARMACIA & UPJOHN COMPANY | 2002-09-12 | — | — | US | claimed |
| US-20020016320-A1 | Compounds to treat alzheimer's disease | ELAN PHARMACEUTICALS, INC. | 2002-02-07 | — | — | US | claimed |
| US-20020009668-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2002-01-24 | — | — | US | claimed |
| WO-2002002506-A2 | COMPOUNDS TO TREAT ALZHEIMER'S DISEASE | ELAN PHARMACEUTICALS, INC. (US) | 2002-01-10 | — | — | WO | claimed |
| WO-2002002512-A2 | COMPOUNDS TO TREAT ALZHEIMER'S DISEASE | ELAN PHARMACEUTICALS, INC. (US) | 2002-01-10 | — | — | WO | claimed |
| EP-1164434-A2 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2001-12-19 | — | — | EP | claimed |
| US-5811475-A | REACTING A CARBON WITH A POLYMER HAVING A REACTIVE GROUP AND A HYDROLYZABLE TERT-ALKYL ACRYLIC ESTER; PRINTING INKS; DIELECTRICS; HIGH ELECTRICAL RESISTANCE | NIPPON OIL CO., LTD. (JP) | 1998-09-22 | — | — | US | claimed |
| US-4826993-A | Substituted diazolidinones | ELI LILLY AND COMPANY (US) | 1989-05-02 | — | — | US | claimed |