Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PRKCA | P17252 | 1/20 | 0.42 |
| ▸ | CYP4F2 | P78329 | 2/20 | 0.37 |
| ▸ | CYP4A11 | Q02928 | 2/20 | 0.37 |
| ▸ | TSHR | P16473 | 1/20 | 0.32 |
| ▸ | HMGCR | P04035 | 1/20 | 0.32 |
| ▸ | RIPK1 | Q13546 | 1/20 | 0.32 |
| ▸ | MMP8 | P22894 | 1/20 | 0.32 |
| ▸ | MAPT | P10636 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14769605 | 0.90 | PRKCA (0.37) | PRKCACYP4F2CYP4A11HMGCRMMP8 | |
| SCHEMBL15177808 | 0.86 | PRKCA (0.43) | PRKCACYP4F2CYP4A11 | |
| SCHEMBL8988305 | 0.86 | MAPT (0.42) | PRKCACYP4F2CYP4A11HMGCRMMP8 | |
| SCHEMBL18388526 | 0.83 | TSHR (0.35) | PRKCACYP4F2CYP4A11TSHRHMGCR | |
| SCHEMBL16521496 | 0.83 | PRKCA (0.33) | PRKCACYP4F2CYP4A11HMGCRMMP8 | |
| SCHEMBL107644 | 0.83 | EGFR (0.36) | PRKCACYP4F2CYP4A11HMGCRMMP8 | |
| SCHEMBL13829150 | 0.82 | PRKCA (0.43) | PRKCACYP4F2CYP4A11TSHRHMGCR | |
| SCHEMBL2681020 | 0.82 | TSHR (0.42) | PRKCACYP4F2CYP4A11TSHRHMGCR | |
| SCHEMBL116867 | 0.81 | LMNA (0.46) | PRKCACYP4F2CYP4A11HMGCR | |
| SCHEMBL12026658 | 0.80 | GAA (0.33) | PRKCACYP4F2CYP4A11HMGCR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11773266-B2 | Polymer, molded body, foam, resin composition, and production method for polymer | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-10-03 | — | — | US | disclosed |
| US-20230129965-A1 | HYDROPHILIC AND OLEOPHOBIC POLYMER | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-04-27 | — | — | US | disclosed |
| US-20180030175-A1 | POLYMER | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2018-02-01 | — | — | US | disclosed |
| US-9217091-B2 | Inkjet recording ink and ink cartridge using the ink, inkjet recording apparatus, inkjet recording method and ink recorded matter | RICOH COMPANY, LTD. (JP) | 2015-12-22 | — | — | US | disclosed |
| US-20140275401-A1 | INKJET RECORDING INK AND INK CARTRIDGE USING THE INK, INKJET RECORDING APPARATUS, INKJET RECORDING METHOD AND INK RECORDED MATTER | RICOH COMPANY, LTD. (JP) | 2014-09-18 | — | — | US | disclosed |
| US-7771913-B2 | Resist composition and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-08-10 | — | — | US | disclosed |
| US-7642034-B2 | Photoresists; (meth)acrylate fluoropolymer which is insoluble in water, dissolvable in aqueous alkaline solution, and immiscible with resist films so that it enables pattern formation by the immersion lithography | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-01-05 | — | — | US | disclosed |
| US-20070231738-A1 | Resist composition and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-10-04 | — | — | US | disclosed |
| US-20070178407-A1 | Polymer, resist protective coating material, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. | 2007-08-02 | — | — | US | disclosed |