SCHEMBL13202805

SCHEMBL13202805

CCN(COC)c1nc(N(COC)COC)nc(N(COC)COC)n1

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TDP1 Q9NUW8 3/20 0.43
TSHR P16473 2/20 0.43
CRHR1 P34998 3/20 0.37
ALOX15 P16050 3/20 0.37
USP2 O75604 1/20 0.37
MAPT P10636 3/20 0.35
SLC29A1 Q99808 1/20 0.34
ALDH1A1 P00352 2/20 0.33
SMN1; SMN2 Q16637 2/20 0.32
KDM4E B2RXH2 1/20 0.32
LMNA P02545 1/20 0.32
HPGD P15428 1/20 0.32
MAPK1 P28482 1/20 0.32
CASP1 P29466 1/20 0.32
CASP7 P55210 1/20 0.32
HSD17B10 Q99714 1/20 0.32
L3MBTL1 Q9Y468 1/20 0.32
HTT P42858 1/20 0.31
TAAR1 Q96RJ0 1/20 0.31
RAB9A P51151 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL16638206 1.00 TDP1 (0.43) TDP1TSHRCRHR1ALOX15USP2
SCHEMBL16284299 0.98 TDP1 (0.47) TDP1TSHRCRHR1ALOX15USP2
SCHEMBL2693585 0.98 TDP1 (0.45) TDP1TSHRCRHR1ALOX15USP2
SCHEMBL9975766 0.95 TDP1 (0.48) TDP1TSHRCRHR1ALOX15USP2
SCHEMBL13006380 0.95 TDP1 (0.48) TDP1TSHRCRHR1ALOX15USP2
SCHEMBL16844937 0.95 TDP1 (0.48) TDP1TSHRCRHR1ALOX15USP2
SCHEMBL123963 0.90 ALDH1A1 (0.38) TDP1TSHRCRHR1MAPTSLC29A1
SCHEMBL26134280 0.90 ALDH1A1 (0.38) TDP1TSHRCRHR1MAPTSLC29A1
SCHEMBL17857263 0.87 SLC29A1 (0.54) TDP1TSHRUSP2MAPTSLC29A1
SCHEMBL18805573 0.86 MAPT (0.43) TDP1TSHRCRHR1ALOX15USP2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2586806-B1 Modified novolak phenolic resin, making method, and resist composition SHINETSU CHEMICAL CO (JP) 2020-04-29 EP disclosed
EP-2364847-B1 PHOTOCURABLE DRY FILM, METHOD FOR PREPARING SAME, PATTERNING METHOD AND FILM FOR PROTECTING ELECTRIC AND ELECTRONIC PARTS SHINETSU CHEMICAL CO (JP) 2015-07-22 EP disclosed
US-7781153-B2 Polymer resin composition, related method for forming a pattern, and related method for fabricating a capacitor SAMSUNG ELECTRONICS CO., LTD. (KR) 2010-08-24 US disclosed