Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TDP1 | Q9NUW8 | 3/20 | 0.48 |
| ▸ | TSHR | P16473 | 2/20 | 0.48 |
| ▸ | ALOX15 | P16050 | 3/20 | 0.41 |
| ▸ | USP2 | O75604 | 1/20 | 0.41 |
| ▸ | MAPT | P10636 | 3/20 | 0.39 |
| ▸ | CRHR1 | P34998 | 2/20 | 0.37 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.35 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.35 |
| ▸ | LMNA | P02545 | 1/20 | 0.35 |
| ▸ | HPGD | P15428 | 1/20 | 0.35 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.35 |
| ▸ | CASP1 | P29466 | 1/20 | 0.35 |
| ▸ | CASP7 | P55210 | 1/20 | 0.35 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.35 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.35 |
| ▸ | SLC29A1 | Q99808 | 1/20 | 0.34 |
| ▸ | CA1 | P00915 | 2/20 | 0.33 |
| ▸ | CA2 | P00918 | 2/20 | 0.33 |
| ▸ | CA9 | Q16790 | 2/20 | 0.33 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL16844937 | 1.00 | TDP1 (0.48) | TDP1TSHRALOX15USP2MAPT | |
| SCHEMBL16284299 | 0.98 | TDP1 (0.47) | TDP1TSHRALOX15USP2MAPT | |
| SCHEMBL13202805 | 0.95 | TDP1 (0.43) | TDP1TSHRALOX15USP2MAPT | |
| SCHEMBL13006380 | 0.95 | TDP1 (0.48) | TDP1TSHRALOX15USP2MAPT | |
| SCHEMBL16638206 | 0.95 | TDP1 (0.43) | TDP1TSHRALOX15USP2MAPT | |
| SCHEMBL2693585 | 0.93 | TDP1 (0.45) | TDP1TSHRALOX15USP2MAPT | |
| SCHEMBL123963 | 0.90 | ALDH1A1 (0.38) | TDP1TSHRMAPTCRHR1ALDH1A1 | |
| SCHEMBL26134280 | 0.90 | ALDH1A1 (0.38) | TDP1TSHRMAPTCRHR1ALDH1A1 | |
| SCHEMBL18805573 | 0.86 | MAPT (0.43) | TDP1TSHRALOX15USP2MAPT | |
| Formaldehyde SCHEMBL3821786 | 0.83 | ALDH1A1 (0.34) | TDP1TSHRALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 27 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11768434-B2 | Polymer having a structure of polyamide, polyamide-imide, or polyimide, photosensitive resin composition, patterning process, photosensitive dry film, and protective film for electric and electronic parts | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-09-26 | — | — | US | disclosed |
| EP-3674350-B1 | PHOTOSENSITIVE RESIN COMPOSITION, LAMINATE, AND PATTERN FORMING PROCESS | SHINETSU CHEMICAL CO (JP) | 2021-11-24 | — | — | EP | disclosed |
| EP-3674350-A1 | PHOTOSENSITIVE RESIN COMPOSITION, LAMINATE, AND PATTERN FORMING PROCESS | Shin-Etsu Chemical Co., Ltd. (JP) | 2020-07-01 | — | — | EP | disclosed |
| US-20180120702-A1 | TETRACARBOXYLIC ACID DIESTER COMPOUND, POLYMER OF POLYIMIDE PRECURSOR AND METHOD FOR PRODUCING SAME, NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS, AND METHOD FOR FORMING CURED FILM | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-05-03 | — | — | US | disclosed |
| US-20180112032-A1 | CURED FILM FORMATION COMPOSITION, ORIENTATION MATERIAL, AND RETARDATION MATERIAL | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2018-04-26 | — | — | US | disclosed |
| US-20180024434-A1 | TETRACARBOXYLIC ACID DIESTER COMPOUND, POLYIMIDE PRECURSOR POLYMER AND METHOD FOR PRODUCING THE SAME, NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS, AND METHOD FOR FORMING CURED FILM | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-01-25 | — | — | US | disclosed |
| US-9862677-B2 | Compound having polymerizable group and crosslinkable group and method for producing the same | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2018-01-09 | — | — | US | disclosed |
| US-9823401-B2 | Cured film formation composition, orientation material, and retardation material | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2017-11-21 | — | — | US | disclosed |
| US-20170298186-A1 | TETRACARBOXYLIC ACID DIESTER COMPOUND, POLYIMIDE PRECURSOR POLYMER AND METHOD FOR PRODUCING THE SAME, NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS, AND METHOD FOR FORMING CURED FILM | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-10-19 | — | — | US | disclosed |
| US-20170255097-A1 | POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, PHOTO-CURABLE DRY FILM AND METHOD FOR PRODUCING THE SAME, PATTERNING PROCESS, AND LAMINATE | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-09-07 | — | — | US | disclosed |
| US-20160025915-A1 | CURED FILM FORMATION COMPOSITION, ORIENTATION MATERIAL, AND RETARDATION MATERIAL | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2016-01-28 | — | — | US | disclosed |
| US-20150370166-A1 | POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, PHOTO-CURABLE DRY FILM AND METHOD FOR PRODUCING SAME, LAYERED PRODUCT, PATTERNING PROCESS, AND SUBSTRATE | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-12-24 | — | — | US | disclosed |
| US-8993699-B2 | Photosensitive resin composition for microlens | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2015-03-31 | — | — | US | disclosed |
| US-8741509-B2 | Colored curable composition, color filter, and method for producing color filter | FUJIFILM CORPORATION (JP) | 2014-06-03 | — | — | US | disclosed |
| US-8674043-B2 | Photosensitive resin composition containing copolymer | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2014-03-18 | — | — | US | disclosed |
| US-8647810-B2 | Resist lower layer film-forming composition, polymer, resist lower layer film, pattern-forming method, and method of producing semiconductor device | JSR CORPORATION (JP) | 2014-02-11 | — | — | US | disclosed |
| US-20120182638-A1 | COLORED CURABLE COMPOSITION, COLOR FILTER, AND METHOD FOR PRODUCING COLOR FILTER | FUJIFILM CORPORATION (JP) | 2012-07-19 | — | — | US | disclosed |
| US-20120172557-A1 | PHOTOSENSITIVE RESIN COMPOSITION CONTAINING COPOLYMER | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2012-07-05 | — | — | US | disclosed |
| US-20120156598-A1 | PHOTOSENSITIVE RESIN COMPOSITION FOR MICROLENS | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2012-06-21 | — | — | US | disclosed |
| US-20120077124-A1 | RESIST LOWER LAYER FILM-FORMING COMPOSITION, POLYMER, RESIST LOWER LAYER FILM, PATTERN-FORMING METHOD, AND METHOD OF PRODUCING SEMICONDUCTOR DEVICE | JSR CORPORATION (JP) | 2012-03-29 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20160025915-A1 | CURED FILM FORMATION COMPOSITION, ORIENTATION MATERIAL, AND RETARDATION MATERIAL | CCNA1, RAD51, SMC1A | TDP1 3144/4885TSHR 4732/4885ALOX15 1238/4885 |
| US-20180120702-A1 | TETRACARBOXYLIC ACID DIESTER COMPOUND, POLYMER OF POLYIMIDE PRECURSOR AND METHOD FOR PRODUCING SAME, NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS, AND METHOD FOR FORMING CURED FILM | TET1, KDM1A, KDM2B | TDP1 1654/4885TSHR 3618/4885ALOX15 1533/4885 |
| US-20180024434-A1 | TETRACARBOXYLIC ACID DIESTER COMPOUND, POLYIMIDE PRECURSOR POLYMER AND METHOD FOR PRODUCING THE SAME, NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS, AND METHOD FOR FORMING CURED FILM | F12, RTF1, PUF60 | TDP1 1251/4885TSHR 2176/4885ALOX15 1611/4885 |
| US-20170298186-A1 | TETRACARBOXYLIC ACID DIESTER COMPOUND, POLYIMIDE PRECURSOR POLYMER AND METHOD FOR PRODUCING THE SAME, NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS, AND METHOD FOR FORMING CURED FILM | ARCN1, COL1A1, F12 | TDP1 1071/4885TSHR 4289/4885ALOX15 989/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.