⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL47427 | 0.82 | — | — | |
| SCHEMBL13808834 | 0.81 | — | — | |
| SCHEMBL824309 | 0.78 | — | — | |
| SCHEMBL15278108 | 0.78 | — | — | |
| SCHEMBL824269 | 0.77 | — | — | |
| SCHEMBL13849044 | 0.77 | — | — | |
| SCHEMBL14313768 | 0.77 | — | — | |
| SCHEMBL13759960 | 0.77 | — | — | |
| SCHEMBL15278109 | 0.75 | L3MBTL1 (0.33) | — | |
| SCHEMBL13818950 | 0.75 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7781144-B2 | Positive resist composition and resist pattern forming method | TOKYO OHKA KOGYO CO., LTD. (JP) | 2010-08-24 | — | — | US | disclosed |
| US-20090035698-A1 | POSITIVE RESIST COMPOSITION AND RESIST PATTERN FORMING METHOD | TOKYO OHKA KOGYO CO., LTD. (JP) | 2009-02-05 | — | — | US | disclosed |