SCHEMBL1324947

SCHEMBL1324947

CCCCCS(=O)(=O)Oc1ccccc1S(=O)(=O)O

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALPL P05186 1/20 0.40
ALPI P09923 1/20 0.40
CA12 O43570 2/20 0.40
CA9 Q16790 2/20 0.40
RECQL P46063 1/20 0.38
ALDH1A1 P00352 2/20 0.38
HTT P42858 2/20 0.38
PTGS2 P35354 3/20 0.38
EPHX2 P34913 1/20 0.38
ELANE P08246 1/20 0.37
MEN1 O00255 1/20 0.36
NR1I2 O75469 1/20 0.36
LMNA P02545 1/20 0.36
CHRM2 P08172 1/20 0.36
CYP3A4 P08684 1/20 0.36
ADRA2A P08913 1/20 0.36
MAPT P10636 1/20 0.36
OPRK1 P41145 1/20 0.36
HTR2B P41595 1/20 0.36
SLC6A3 Q01959 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1173472 0.80 CYP3A4 (0.53) CA12CA9ALDH1A1MEN1NR1I2
SCHEMBL6322286 0.79 EPHX2 (0.46) CA12CA9RECQLALDH1A1HTT
SCHEMBL4957587 0.79 RBP4 (0.44) ALPLALPIALDH1A1HTTMMP1
SCHEMBL5837273 0.78 EPHX2 (0.46) CA12CA9RECQLALDH1A1HTT
SCHEMBL5837264 0.78 EPHX2 (0.46) CA12CA9RECQLALDH1A1HTT
SCHEMBL2374925 0.78 ALPL (0.50) ALPLALPIALDH1A1HTTMEN1
SCHEMBL7520068 0.78 LMNA (0.55) RECQLALDH1A1MEN1NR1I2LMNA
SCHEMBL179760 0.78 LMNA (0.55) RECQLALDH1A1MEN1NR1I2LMNA
SCHEMBL8770368 0.78 LMNA (0.55) RECQLALDH1A1MEN1NR1I2LMNA
SCHEMBL10610006 0.78 CYP1A2 (0.53) ALPLALPIALDH1A1HTTPTGS2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 25 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20160319434-A9 UV CURABLE CATALYST COMPOSITIONS ROHM & HAAS ELECT MAT (US) 2016-11-03 US disclosed
EP-1676937-B1 UV curable catalyst compositions ROHM & HAAS ELECT MAT (US) 2016-06-01 EP disclosed
US-20140065411-A1 UV CURABLE CATALYST COMPOSITIONS ROHM & HAAS ELECT MAT (US) 2014-03-06 US disclosed
US-8575057-B2 UV curable catalyst compositions ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2013-11-05 US disclosed
US-8053160-B2 Imaging compositions and methods ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2011-11-08 US disclosed
US-7270932-B2 Imaging composition and method ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2007-09-18 US disclosed
EP-1790429-A1 Imaging methods Rohm and Haas Electronic Materials, L.L.C. (US) 2007-05-30 EP disclosed
US-7223519-B2 Xanthene senstitizers that affect color or shade change upon application of low energy; oxidizers, and aminocarboxylic acid amphoteric surfactant; may be peeled from workpiece in which they are coated; boats, vehicles ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2007-05-29 US disclosed
US-20070117042-A1 Imaging methods ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2007-05-24 US disclosed
US-7144676-B2 Imaging compositions and methods ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2006-12-05 US disclosed
US-20050175931-A1 Imaging compositions and methods ROHM AND HAAS ELECTRONIC MATERIALS, L.L.C. (US) 2005-08-11 US disclosed
US-20050175929-A1 Imaging composition and method ROHM AND HASS ELECTRONIC MATERIALS, L.L.C. (US) 2005-08-11 US disclosed
EP-1562074-A1 Imaging compositions and methods Rohm and Haas Electronic Materials, L.L.C. (US) 2005-08-10 EP disclosed
EP-1562073-A1 Imaging composition and method Rohm and Haas Electronic Materials, L.L.C. (US) 2005-08-10 EP disclosed
US-6551758-B2 For use in microfabrication of integrated circuits SHIN-ETSU CHEMICAL CO. LTD. (JP) 2003-04-22 US disclosed
US-6551758-B2 For use in microfabrication of integrated circuits SHIN-ETSU CHEMICAL CO. LTD. (JP) 2003-04-22 US disclosed
US-6440634-B1 MICROFABRICATION OF INTEGRATED CIRCUITS, DEEP UV LITHOGRAPHY; PHENYLSULFONATE SALTS OF SULFONIUM OR IODINIUM CATIONS SHIN-ETSU CHEMICAL CO., LTD (JP) 2002-08-27 US disclosed
US-20020077493-A1 Novel onium salts, photoacid generators, resist compositions, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2002-06-20 US disclosed
US-20020077493-A1 Novel onium salts, photoacid generators, resist compositions, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2002-06-20 US disclosed
EP-1077391-A1 Onium salts, photoacid generators for resist compositions, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2001-02-21 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20020077493-A1 Novel onium salts, photoacid generators, resist compositions, and patterning process ABL1, PI4K2B, FES ALPL 3054/4885ALPI 3889/4885CA12 4002/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.