Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TP53 | P04637 | 2/20 | 0.41 |
| ▸ | MMP1 | P03956 | 1/20 | 0.38 |
| ▸ | MMP9 | P14780 | 1/20 | 0.38 |
| ▸ | MMP12 | P39900 | 1/20 | 0.38 |
| ▸ | ALDH1A1 | P00352 | 6/20 | 0.36 |
| ▸ | KMT2A | Q03164 | 6/20 | 0.36 |
| ▸ | POLB | P06746 | 5/20 | 0.36 |
| ▸ | L3MBTL1 | Q9Y468 | 4/20 | 0.36 |
| ▸ | LMNA | P02545 | 3/20 | 0.36 |
| ▸ | MEN1 | O00255 | 3/20 | 0.36 |
| ▸ | PKM | P14618 | 3/20 | 0.36 |
| ▸ | PTPN7 | P35236 | 3/20 | 0.36 |
| ▸ | RECQL | P46063 | 3/20 | 0.36 |
| ▸ | BLM | P54132 | 3/20 | 0.36 |
| ▸ | TDP1 | Q9NUW8 | 3/20 | 0.36 |
| ▸ | RAB9A | P51151 | 3/20 | 0.36 |
| ▸ | HPGD | P15428 | 3/20 | 0.36 |
| ▸ | ALOX15 | P16050 | 3/20 | 0.36 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.36 |
| ▸ | MAPT | P10636 | 2/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Furan SCHEMBL16198063 | 0.87 | TDP1 (0.38) | TP53MMP1MMP9MMP12ALDH1A1 | |
| SCHEMBL3227201 | 0.82 | LTA4H (0.50) | TP53ALDH1A1KMT2APOLBLMNA | |
| Water SCHEMBL29272691 | 0.79 | TP53 (0.39) | TP53MMP1MMP9MMP12ALDH1A1 | |
| Water SCHEMBL29272692 | 0.79 | TP53 (0.39) | TP53MMP1MMP9MMP12ALDH1A1 | |
| SCHEMBL6847362 | 0.77 | — | — | |
| SCHEMBL10495916 | 0.77 | — | — | |
| SCHEMBL827212 | 0.77 | — | — | |
| SCHEMBL3128596 | 0.77 | — | — | |
| SCHEMBL29033107 | 0.77 | ALDH1A1 (0.39) | TP53MMP1MMP9MMP12ALDH1A1 | |
| SCHEMBL10791737 | 0.77 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 46 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-115551697-A | Device and method for treating the surface of a molded part | 戴漫森有限责任公司 | 2022-12-30 | — | — | CN | claimed |
| CN-1296007-A | Perfumery | PFW AROMATIC CHEMICALS N V (NL) | 2001-05-23 | — | — | CN | claimed |
| EP-0505094-A1 | Speed stabilised positive-acting photoresist compositions | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1992-09-23 | — | — | EP | claimed |
| WO-2024217450-A1 | METHOD FOR PREPARING POLYETHER ESTER POLYOL AND PRODUCT THEREOF | 郑州中远氨纶工程技术有限公司 | 2024-10-24 | — | — | WO | disclosed |
| CN-118666811-A | Substituted pyrrolidone compound and preparation method, composition and application thereof | 青岛清原化合物有限公司 | 2024-09-20 | — | — | CN | disclosed |
| CN-118119273-A | ALS-inhibitor herbicide tolerant beet hybrids with enhanced hybrid vigour | 拜耳公司 | 2024-05-31 | — | — | CN | disclosed |
| CN-115737732-A | Medicine composition for treating compact osteitis | 北京朕荣国际生物科技有限公司 | 2023-03-07 | — | — | CN | disclosed |
| CN-115551697-A | Device and method for treating the surface of a molded part | 戴漫森有限责任公司 | 2022-12-30 | — | — | CN | disclosed |
| CN-105935588-B | Regeneration of clay catalysts for aromatic ring alkylation | 朗盛公司 | 2021-08-03 | — | — | CN | disclosed |
| CN-111266135-B | Multifunctional acid catalyst and preparation method and application thereof | 厦门大学 | 2021-05-14 | — | — | CN | disclosed |
| CN-111266135-A | Multifunctional acid catalyst and preparation method and application thereof | 厦门大学 | 2020-06-12 | — | — | CN | disclosed |
| EP-0778495-B1 | Resist composition with radiation sensitive acid generator | IBM (US) | 2002-01-23 | — | — | EP | disclosed |
| US-6277546-B1 | Process for imaging of photoresist | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2001-08-21 | — | — | US | disclosed |
| CN-1296007-A | Perfumery | PFW AROMATIC CHEMICALS N V (NL) | 2001-05-23 | — | — | CN | disclosed |
| US-6165673-A | Resist composition with radiation sensitive acid generator | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2000-12-26 | — | — | US | disclosed |
| EP-0596668-B1 | Process for imaging of photoresist | IBM (US) | 1999-04-14 | — | — | EP | disclosed |
| US-5665527-A | Process for generating negative tone resist images utilizing carbon dioxide critical fluid | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 1997-09-09 | — | — | US | disclosed |
| EP-0778495-A1 | Resist composition with radiation sensitive acid generator | International Business Machines Corporation (US) | 1997-06-11 | — | — | EP | disclosed |
| US-5585220-A | Resist composition with radiation sensitive acid generator | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 1996-12-17 | — | — | US | disclosed |
| EP-0596668-A2 | Process for imaging of photoresist | International Business Machines Corporation (US) | 1994-05-11 | — | — | EP | disclosed |