Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 7/20 | 0.57 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.57 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.57 |
| ▸ | HPGD | P15428 | 1/20 | 0.52 |
| ▸ | TP53 | P04637 | 3/20 | 0.47 |
| ▸ | HIF1A | Q16665 | 3/20 | 0.47 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.47 |
| ▸ | THRB | P10828 | 2/20 | 0.40 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.39 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.39 |
| ▸ | ATM | Q13315 | 1/20 | 0.33 |
| ▸ | HCAR2 | Q8TDS4 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL21123175 | 0.89 | TSHR (0.50) | TSHRALDH1A1CYP3A4HPGDTP53 | |
| SCHEMBL13240556 | 0.86 | TSHR (0.57) | TSHRALDH1A1CYP3A4HPGDTP53 | |
| SCHEMBL774980 | 0.84 | TSHR (0.59) | TSHRALDH1A1CYP3A4HPGDTP53 | |
| SCHEMBL12199987 | 0.84 | TSHR (0.59) | TSHRALDH1A1CYP3A4HPGDTP53 | |
| SCHEMBL8373745 | 0.83 | TSHR (0.63) | TSHRALDH1A1CYP3A4HPGDTP53 | |
| SCHEMBL19343411 | 0.82 | TSHR (0.57) | TSHRALDH1A1CYP3A4HPGDTP53 | |
| SCHEMBL799029 | 0.81 | TSHR (0.55) | TSHRALDH1A1CYP3A4HPGDTP53 | |
| SCHEMBL23321919 | 0.80 | TSHR (0.59) | TSHRALDH1A1CYP3A4HPGDTP53 | |
| SCHEMBL12200005 | 0.79 | TSHR (0.53) | TSHRALDH1A1CYP3A4HPGDTP53 | |
| SCHEMBL17538840 | 0.79 | TSHR (0.68) | TSHRALDH1A1CYP3A4HPGDTP53 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 19 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20210341839-A1 | FLUOROCARBOXYLIC ACID-CONTAINING MONOMER, FLUOROCARBOXYLIC ACID-CONTAINING POLYMER, RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2021-11-04 | — | — | US | disclosed |
| US-20210333712-A1 | IODIZED AROMATIC CARBOXYLIC ACID TYPE PENDANT-CONTAINING POLYMER, RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2021-10-28 | — | — | US | disclosed |
| US-7759044-B2 | Polymer, a photoacid generator and a dissolution modification agent; patterning; image resolution | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2010-07-20 | — | — | US | disclosed |
| US-7700262-B2 | Top coat material and use thereof in lithography processes | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2010-04-20 | — | — | US | disclosed |
| US-7700262-B2 | Top coat material and use thereof in lithography processes | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2010-04-20 | — | — | US | disclosed |
| US-20080166568-A1 | TOP COAT MATERIAL AND USE THEREOF IN LITHOGRAPHY PROCESSES | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2008-07-10 | — | — | US | disclosed |
| US-20080166568-A1 | TOP COAT MATERIAL AND USE THEREOF IN LITHOGRAPHY PROCESSES | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2008-07-10 | — | — | US | disclosed |
| US-20080153034-A1 | Polymer, a photoacid generator and a dissolution modification agent; patterning; image resolution | GLOBALFOUNDRIES INC. (KY) | 2008-06-26 | — | — | US | disclosed |
| US-7358029-B2 | Polymer, a photoacid generator and a dissolution modification agent; patterning; image resolution | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2008-04-15 | — | — | US | disclosed |
| US-7358029-B2 | Polymer, a photoacid generator and a dissolution modification agent; patterning; image resolution | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2008-04-15 | — | — | US | disclosed |
| US-7335456-B2 | Top coat material and use thereof in lithography processes | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2008-02-26 | — | — | US | disclosed |
| US-7335456-B2 | Top coat material and use thereof in lithography processes | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2008-02-26 | — | — | US | disclosed |
| US-20080038676-A1 | TOP COAT MATERIAL AND USE THEREOF IN LITHOGRAPHY PROCESSES | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2008-02-14 | — | — | US | disclosed |
| US-20080038676-A1 | TOP COAT MATERIAL AND USE THEREOF IN LITHOGRAPHY PROCESSES | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2008-02-14 | — | — | US | disclosed |
| US-20070231734-A1 | Polymer, a photoacid generator and a dissolution modification agent; patterning; image resolution | GLOBALFOUNDRIES U.S. INC. | 2007-10-04 | — | — | US | disclosed |
| US-20070231734-A1 | Polymer, a photoacid generator and a dissolution modification agent; patterning; image resolution | GLOBALFOUNDRIES U.S. INC. | 2007-10-04 | — | — | US | disclosed |
| US-7235342-B2 | Negative photoresist composition including non-crosslinking chemistry | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2007-06-26 | — | — | US | disclosed |
| US-7235342-B2 | Negative photoresist composition including non-crosslinking chemistry | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2007-06-26 | — | — | US | disclosed |
| WO-2007039346-A2 | LOW ACTIVATION ENERGY DISSOLUTION MODIFICATION AGENTS FOR PHOTORESIST APPLICATIONS | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2007-04-12 | — | — | WO | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20210341839-A1 | FLUOROCARBOXYLIC ACID-CONTAINING MONOMER, FLUOROCARBOXYLIC ACID-CONTAINING POLYMER, RESIST COMPOSITION AND PATTERNING PROCESS | NAF1, PFN1, COL1A1 | TSHR 4479/4885ALDH1A1 640/4885CYP3A4 4386/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.