Methacrylic Acid

Methacrylic Acid

SCHEMBL1326693

C=C(C)C(=O)O.CCC(COCC1CO1)(COCC1CO1)COCC1CO1

nearest known ligand 0.49

Full drug profile on Sugi Atlas →

Predicted protein targets (top 9)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 5/20 0.49
TSHR P16473 2/20 0.46
MAPK1 P28482 1/20 0.46
SMN1; SMN2 Q16637 1/20 0.38
TDP1 Q9NUW8 2/20 0.36
THRB P10828 1/20 0.36
TP53 P04637 1/20 0.35
CYP3A4 P08684 1/20 0.35
MGLL Q99685 2/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Methacrylic Acid SCHEMBL6054057 1.00 ALDH1A1 (0.49) ALDH1A1TSHRMAPK1SMN1; SMN2TDP1
Bicarbonate SCHEMBL17599133 0.89 TSHR (0.53) ALDH1A1TSHRMAPK1SMN1; SMN2TDP1
Acrylic Acid SCHEMBL2774945 0.85 TSHR (0.46) ALDH1A1TSHRMAPK1SMN1; SMN2TDP1
Methacrylic Acid SCHEMBL3458430 0.84 TSHR (0.68) ALDH1A1TSHRMAPK1SMN1; SMN2TDP1
Methacrylic Acid SCHEMBL925804 0.84 TSHR (0.68) ALDH1A1TSHRMAPK1SMN1; SMN2TDP1
Methacrylic Acid SCHEMBL9640645 0.84 TSHR (0.53) ALDH1A1TSHRMAPK1SMN1; SMN2TDP1
Methacrylic Acid SCHEMBL21811308 0.84 ALDH1A1 (0.61) ALDH1A1TSHRMAPK1SMN1; SMN2TDP1
Methacrylic Acid SCHEMBL236566 0.84 ALDH1A1 (0.61) ALDH1A1TSHRMAPK1SMN1; SMN2TDP1
Methacrylic Acid SCHEMBL2937502 0.84 ALDH1A1 (0.61) ALDH1A1TSHRMAPK1SMN1; SMN2TDP1
SCHEMBL23734812 0.83 TSHR (0.63) ALDH1A1TSHRMAPK1SMN1; SMN2TDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 111 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0738608-A2 Curable compositions and their use for the formation of a printing material CANON KABUSHIKI KAISHA (JP) 1996-10-23 EP claimed
US-5451397-A Crosslinked amino functional acrylic amide polymer, reducing blood cholesterol levels ROHM AND HAAS COMPANY (US) 1995-09-19 US claimed
US-20240230952-A1 LAMINATE AND METHOD FOR MANUFACTURING LAMINATE FUJIFILM CORPORATION (JP) 2024-07-11 US disclosed
US-12032286-B2 Method for producing multi-layered type microchannel device using photosensitive resin laminate ASAHI KASEI KABUSHIKI KAISHA (JP) 2024-07-09 US disclosed
US-20240059803-A1 PHOTOSENSITIVE RESIN MULTILAYER BODY AND METHOD FOR PRODUCING SAME ASAHI KASEI KABUSHIKI KAISHA (JP) 2024-02-22 US disclosed
US-20240012326-A1 PHOTOSENSITIVE ELEMENT, AND METHOD FOR FORMING RESIST PATTERN ASAHI KASEI KABUSHIKI KAISHA (JP) 2024-01-11 US disclosed
US-20230340330-A1 COMPOSITION FOR COLOR CONVERSION FILM, COLOR CONVERSION FILM, METHOD FOR MANUFACTURING COLOR CONVERSION FILM, BACKLIGHT UNIT, AND LIQUID CRYSTAL DISPLAY DEVICE FUJIFILM CORPORATION (JP) 2023-10-26 US disclosed
US-20230324739-A1 COMPOSITION FOR COLOR CONVERSION FILM, COLOR CONVERSION FILM, METHOD FOR MANUFACTURING COLOR CONVERSION FILM, BACKLIGHT UNIT, AND LIQUID CRYSTAL DISPLAY DEVICE FUJIFILM CORPORATION (JP) 2023-10-12 US disclosed
WO-2023042737-A1 LAMINATE AND METHOD FOR MANUFACTURING LAMINATE 富士フイルム株式会社 2023-03-23 WO disclosed
US-20230053900-A1 METHOD FOR PRODUCING MULTI-LAYERED TYPE MICROCHANNEL DEVICE USING PHOTOSENITIVE RESIN LAMINATE ASAHI KASEI KABUSHIKI KAISHA (JP) 2023-02-23 US disclosed
US-20200393754-A1 METHOD FOR PRODUCING MULTI-LAYERED TYPE MICROCHANNEL DEVICE USING PHOTOSENITIVE RESIN LAMINATE ASAHI KASEI KABUSHIKI KAISHA (JP) 2020-12-17 US disclosed
US-5149776-A CROSS-LINKING HARDENABLE RESIN COMPOSITION, METAL LAMINATES THEREOF AND METAL SURFACE PROCESSING METHOD THEREWITH MITSUBISHI RAYON CO., LTD. (JP) 1992-09-22 US disclosed
EP-0295044-B1 PHOTOINITIATOR AND PHOTOPOLYMERIZABLE COMPOSITION USING THE SAME Hitachi Chemical Co., Ltd. (JP) 1992-04-22 EP disclosed
US-5034429-A An unsaturated monomer, a photoinitiator and a benzene derivative for providing a cured film HITACHI CHEMICAL CO., LTD. (JP) 1991-07-23 US disclosed
EP-0429279-A1 Photocross-linkable resin compositions and their use in the manufacture of dry film resists MITSUBISHI RAYON CO., LTD. (JP) 1991-05-29 EP disclosed
US-4987057-A HIGH SENSITIVITY TO VISIBLE LIGHT RAYS HITACHI CHEMICAL CO., LTD. (JP) 1991-01-22 US disclosed
US-4985343-A Crosslinking-curable resin composition MITSUBISHI RAYON CO., LTD. (JP) 1991-01-15 US disclosed
EP-0382524-A2 Crosslinking-curable resin composition MITSUBISHI RAYON CO., LTD. (JP) 1990-08-16 EP disclosed
EP-0295044-A2 Photoinitiator and photopolymerizable composition using the same Hitachi Chemical Co., Ltd. (JP) 1988-12-14 EP disclosed
EP-0294220-A2 Photopolymerizable composition Hitachi Chemical Co., Ltd. (JP) 1988-12-07 EP disclosed