Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 2/20 | 0.46 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.46 |
| ▸ | THRB | P10828 | 1/20 | 0.45 |
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.42 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.38 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.36 |
| ▸ | TP53 | P04637 | 1/20 | 0.35 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.35 |
| ▸ | MGLL | Q99685 | 2/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Bicarbonate SCHEMBL17599133 | 0.89 | TSHR (0.53) | TSHRMAPK1THRBALDH1A1SMN1; SMN2 | |
| Acrylic Acid SCHEMBL16341445 | 0.87 | TSHR (0.49) | TSHRMAPK1THRBALDH1A1SMN1; SMN2 | |
| Methacrylic Acid SCHEMBL1326693 | 0.85 | ALDH1A1 (0.49) | TSHRMAPK1THRBALDH1A1SMN1; SMN2 | |
| Methacrylic Acid SCHEMBL6054057 | 0.85 | ALDH1A1 (0.49) | TSHRMAPK1THRBALDH1A1SMN1; SMN2 | |
| SCHEMBL23734812 | 0.83 | TSHR (0.63) | TSHRMAPK1THRBALDH1A1SMN1; SMN2 | |
| SCHEMBL36668 | 0.83 | TSHR (0.63) | TSHRMAPK1THRBALDH1A1SMN1; SMN2 | |
| SCHEMBL13067061 | 0.83 | TSHR (0.63) | TSHRMAPK1THRBALDH1A1SMN1; SMN2 | |
| SCHEMBL21647280 | 0.82 | THRB (0.54) | TSHRMAPK1THRBALDH1A1SMN1; SMN2 | |
| Acrylic Acid SCHEMBL28460047 | 0.82 | ALDH1A1 (0.48) | TSHRMAPK1ALDH1A1SMN1; SMN2TDP1 | |
| Acrylic Acid SCHEMBL3797727 | 0.82 | ALDH1A1 (0.48) | TSHRMAPK1ALDH1A1SMN1; SMN2TDP1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 138 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8252879-B2 | Photosensitive resin, method for preparing the resin, photosensitive resin composition and cured product of the resin composition | LG CHEM, LTD. (KR) | 2012-08-28 | — | — | US | claimed |
| US-8182979-B2 | Photopolymerization initiator containing unsaturated double bond and oxime ester group and photosensitive resin composition comprising the same | LG CHEM, LTD. (KR) | 2012-05-22 | — | — | US | claimed |
| US-20100112479-A1 | Photopolymerization initiator containing unsaturated double bond and oxime ester group and photosensitive resin composition comprising the same | LG CHEM. LTD. (KR) | 2010-05-06 | — | — | US | claimed |
| US-7682774-B2 | Resin composition comprising catalyst precursor for electroless plating to form electromagnetic wave shielding layer, methods for forming metal patterns using the resin composition and metal patterns formed by the methods | LG CHEM, LTD. (KR) | 2010-03-23 | — | — | US | claimed |
| WO-2007119966-A1 | RESIN COMPOSITION COMPRISING CATALYST PRECURSOR FOR ELECTROLESS PLATING TO FORM ELECTROMAGNETIC WAVE SHIELDING LAYER, METHODS FOR FORMING METAL PATTERNS USING THE RESIN COMPOSITION AND METAL PATTERNS FORMED BY THE METHODS | LG CHEM, LTD. (KR) | 2007-10-25 | — | — | WO | claimed |
| US-20070243363-A1 | Resin composition comprising catalyst precursor for electroless plating to form electromagnetic wave shielding layer, methods for forming metal patterns using the resin composition and metal patterns formed by the methods | LG CHEM, LTD. (KR) | 2007-10-18 | — | — | US | claimed |
| WO-2004107052-A1 | NEGATIVE PHOTORESIST COMPOSITION FOR SPINLESS (SLIT) COATING | ADMS TECHNOLOGY CO., LTD. (KR) | 2004-12-09 | — | — | WO | claimed |
| WO-2004097522-A1 | NEGATIVE RESIST COMPOSITION FOR ORGANIC INSULATOR OF HIGH APERTURE LCD | ADMS TECHNOLOGY CO. LTD. (KR) | 2004-11-11 | — | — | WO | claimed |
| US-12037518-B2 | Pressure-sensitive adhesive composition, pressure-sensitive adhesive layer comprising same, and foldable display including same pressure-sensitive adhesive layer | LG CHEM, LTD. (KR) | 2024-07-16 | — | — | US | disclosed |
| US-12018190-B2 | Adhesive composition, adhesive film comprising same, backplate film comprising adhesive film, and plastic organic light-emitting display comprising adhesive film | LG CHEM, LTD. (KR) | 2024-06-25 | — | — | US | disclosed |
| US-12018188-B2 | Adhesive composition, adhesive film comprising same, backplate film comprising adhesive film, and plastic organic light emitting display comprising adhesive film | LG CHEM, LTD. (KR) | 2024-06-25 | — | — | US | disclosed |
| US-12012535-B2 | Adhesive composition, adhesive film comprising same, backplate film comprising adhesive film, and plastic organic light emitting display comprising adhesive film | LG CHEM, LTD. (KR) | 2024-06-18 | — | — | US | disclosed |
| US-12006449-B2 | Adhesive composition, adhesive film comprising same, back plate film comprising adhesive film and plastic organic light-emitting display comprising adhesive film | LG CHEM, LTD. (KR) | 2024-06-11 | — | — | US | disclosed |
| US-12006456-B2 | Adhesive composition, adhesion film comprising same, backplate film comprising adhesion film, and plastic organic light-emitting display comprising adhesion film | LG CHEM, LTD. (KR) | 2024-06-11 | — | — | US | disclosed |
| US-20070243363-A1 | Resin composition comprising catalyst precursor for electroless plating to form electromagnetic wave shielding layer, methods for forming metal patterns using the resin composition and metal patterns formed by the methods | LG CHEM, LTD. (KR) | 2007-10-18 | — | — | US | disclosed |
| US-20070190429-A1 | COMPOSITION FOR INKJET SPACER FORMATION AND SPACER ELEMENT USING THE SAME | LG CHEM, LTD. (KR) | 2007-08-16 | — | — | US | disclosed |
| US-7097959-B1 | Negative resist composition | ADMS TECHNOLOGY CO., LTD. (KR) | 2006-08-29 | — | — | US | disclosed |
| US-20040257416-A1 | Ink composition for inkjet spacer fomation and spacer element using the same | LG CHEM, LTD. (KR) | 2004-12-23 | — | — | US | disclosed |
| WO-2004107052-A1 | NEGATIVE PHOTORESIST COMPOSITION FOR SPINLESS (SLIT) COATING | ADMS TECHNOLOGY CO., LTD. (KR) | 2004-12-09 | — | — | WO | disclosed |
| WO-2004065502-A1 | INK COMPOSITION FOR INKJET SPACER FORMATION AND SPACER ELEMENT USING THE SAME | LG CHEM, LTD. (KR) | 2004-08-05 | — | — | WO | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20100112479-A1 | Photopolymerization initiator containing unsaturated double bond and oxime ester group and photosensitive resin composition comprising the same | ALOX5, ALKBH2, RAD51 | TSHR 2703/4885MAPK1 2671/4885THRB 1460/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.