SCHEMBL132890

SCHEMBL132890

CCCCC(C)(OC(=O)C(C)(C)CC)C1CCCC1

nearest known ligand 0.37

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
NAAA Q02083 2/20 0.33
FKBP1A P62942 5/20 0.33
HMGCR P04035 2/20 0.33
CCR2 P41597 3/20 0.32
CCR1 P32246 1/20 0.32
CCR5 P51681 1/20 0.32
CXCR4 P61073 1/20 0.32
CYP1A2 P05177 1/20 0.31
CHRM2 P08172 1/20 0.30
CHRM4 P08173 1/20 0.30
CHRM1 P11229 1/20 0.30
CHRM3 P20309 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18802884 0.89 FKBP1A (0.33) NAAAFKBP1AHMGCRCCR2CHRM2
SCHEMBL132896 0.85 FKBP1A (0.36) FKBP1AHMGCRCCR2CHRM2CHRM4
SCHEMBL132878 0.84 FKBP1A (0.35) FKBP1AHMGCRCCR2CHRM2CHRM4
SCHEMBL130743 0.82 FKBP1A (0.36) NAAAFKBP1AHMGCRCCR2CCR1
SCHEMBL16125544 0.79 HMGCR (0.32) FKBP1AHMGCR
SCHEMBL18802873 0.78 FKBP1A (0.37) NAAAFKBP1AHMGCRCCR2CHRM2
SCHEMBL18802850 0.77 NAAA (0.38) NAAAFKBP1ACCR2CCR1CCR5
SCHEMBL13220257 0.77 FKBP1A (0.37) FKBP1AHMGCRCCR2CHRM2CHRM4
SCHEMBL107891 0.77 FKBP1A (0.37) FKBP1AHMGCRCCR2CHRM2CHRM4
SCHEMBL16662477 0.76 EPHX2 (0.33)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9052594-B2 Positive photosensitive composition and method of forming pattern using the same FUJIFILM CORPORATION (JP) 2015-06-09 US disclosed
US-20120058431-A1 POSITIVE PHOTOSENSITIVE COMPOSITION AND METHOD OF FORMING PATTERN USING THE SAME FUJIFILM CORPORATION (JP) 2012-03-08 US disclosed
US-20070172761-A1 Positive photosensitive composition and method of forming pattern using the same FUJIFILM CORPORATION (JP) 2007-07-26 US disclosed