Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | DPP4 | P27487 | 10/20 | 0.47 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.36 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.36 |
| ▸ | HPGD | P15428 | 1/20 | 0.36 |
| ▸ | EHMT2 | Q96KQ7 | 1/20 | 0.36 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.36 |
| ▸ | EHMT1 | Q9H9B1 | 1/20 | 0.36 |
| ▸ | DPP9 | Q86TI2 | 1/20 | 0.35 |
| ▸ | ZDHHC20 | Q5W0Z9 | 3/20 | 0.34 |
| ▸ | ZDHHC2 | Q9UIJ5 | 1/20 | 0.34 |
| ▸ | ELANE | P08246 | 1/20 | 0.33 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.31 |
| ▸ | MCL1 | Q07820 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8095687 | 0.82 | ALDH1A1 (0.48) | ALDH1A1CYP3A4HPGDEHMT2HSD17B10 | |
| SCHEMBL22379984 | 0.71 | ALDH1A1 (0.37) | DPP4ALDH1A1CYP3A4HPGDEHMT2 | |
| SCHEMBL11650184 | 0.71 | ALDH1A1 (0.43) | ALDH1A1CYP3A4HPGDEHMT2HSD17B10 | |
| SCHEMBL2678230 | 0.71 | ALDH1A1 (0.45) | ALDH1A1CYP3A4HPGDEHMT2HSD17B10 | |
| SCHEMBL6399271 | 0.71 | ALDH1A1 (0.45) | ALDH1A1CYP3A4HPGDEHMT2HSD17B10 | |
| SCHEMBL10803777 | 0.70 | DPP4 (0.50) | DPP4ALDH1A1HSD17B10DPP9ZDHHC20 | |
| SCHEMBL16255362 | 0.70 | — | — | |
| SCHEMBL14335656 | 0.69 | HSD17B10 (0.46) | ALDH1A1CYP3A4HPGDEHMT2HSD17B10 | |
| SCHEMBL9878936 | 0.68 | CA1 (0.45) | ALDH1A1CYP3A4HPGDEHMT2HSD17B10 | |
| SCHEMBL9879335 | 0.66 | CA12 (0.41) | ALDH1A1CYP3A4HPGDEHMT2HSD17B10 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 27 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10593980-B2 | Ionomer resin, and ionomer solution, multilayer body, member, electrochemical element, and electrochemical device that include the same | NITTO DENKO CORPORATION (JP) | 2020-03-17 | — | — | US | disclosed |
| US-20180053943-A1 | IONOMER RESIN, AND IONOMER SOLUTION, MULTILAYER BODY, MEMBER, ELECTROCHEMICAL ELEMENT, AND ELECTROCHEMICAL DEVICE THAT INCLUDE THE SAME | NITTO DENKO CORPORATION (JP) | 2018-02-22 | — | — | US | disclosed |
| EP-3269743-A1 | IONOMER RESIN AND IONOMER SOLUTION CONTAINING SAME, LAMINATE, MEMBER, ELECTROCHEMICAL ELEMENT, AND ELECTROCHEMICAL DEVICE | Nitto Denko Corporation (JP) | 2018-01-17 | — | — | EP | disclosed |
| US-9200098-B2 | Radiation-sensitive composition and compound | JSR CORPORATION (JP) | 2015-12-01 | — | — | US | disclosed |
| US-9023584-B2 | Radiation-sensitive composition, and compound | JSR CORPORATION (JP) | 2015-05-05 | — | — | US | disclosed |
| US-8968980-B2 | Radiation-sensitive resin composition and compound | JSR CORPORATION (JP) | 2015-03-03 | — | — | US | disclosed |
| US-8809476-B2 | Polymer | JSR CORPORATION (JP) | 2014-08-19 | — | — | US | disclosed |
| US-8632945-B2 | Radiation-sensitive resin composition, monomer, polymer, and production method of radiation-sensitive resin composition | JSR CORPORATION (JP) | 2014-01-21 | — | — | US | disclosed |
| US-20130280658-A1 | RADIATION-SENSITIVE COMPOSITION, AND COMPOUND | JSR CORPORATION (JP) | 2013-10-24 | — | — | US | disclosed |
| US-8470513-B2 | Radiation-sensitive resin composition and polymer | JSR CORPORATION (JP) | 2013-06-25 | — | — | US | disclosed |
| US-20120045719-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND COMPOUND | JSR CORPORATION (JP) | 2012-02-23 | — | — | US | disclosed |
| US-7977442-B2 | Radiation-sensitive composition, polymer and monomer | JSR CORPORATION (JP) | 2011-07-12 | — | — | US | disclosed |
| US-20100331440-A1 | RADIATION-SENSITIVE COMPOSITION, POLYMER AND MONOMER | JSR CORPORATION (JP) | 2010-12-30 | — | — | US | disclosed |
| US-20100310987-A1 | POLYMER, RADIATION-SENSITIVE COMPOSITION, MONOMER, AND METHOD OF PRODUCING COMPOUND | JSR CORPORATION (JP) | 2010-12-09 | — | — | US | disclosed |
| US-7816475-B2 | Aminoalkoxystyrene, process for preparation thereof, polymer thereof, process for producing the polymer and use thereof | TOSOH CORPORATION (JP) | 2010-10-19 | — | — | US | disclosed |
| EP-1829857-B1 | Aminoalkoxystyrene, process for preparation thereof, polymer thereof, process for producing the polymer and use thereof | TOSOH CORP (JP) | 2009-11-04 | — | — | EP | disclosed |
| US-20070213490-A1 | Aminoalkoxystyrene, process for preparation thereof, polymer thereof, process for producing the polymer and use thereof | TOSOH CORPORATION | 2007-09-13 | — | — | US | disclosed |
| EP-1829857-A1 | Aminoalkoxystyrene, process for preparation thereof, polymer thereof, process for producing the polymer and use thereof | Tosoh Corporation (JP) | 2007-09-05 | — | — | EP | disclosed |
| US-7105269-B2 | Copolymer, polymer mixture, and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2006-09-12 | — | — | US | disclosed |
| US-20030157423-A1 | Copolymer, polymer mixture, and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2003-08-21 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20120045719-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND COMPOUND | RFT1, RER1, ZYX | DPP4 4264/4885ALDH1A1 1997/4885CYP3A4 3894/4885 |
| US-20100331440-A1 | RADIATION-SENSITIVE COMPOSITION, POLYMER AND MONOMER | ALG1, MRE11, PCNA | DPP4 4773/4885ALDH1A1 2187/4885CYP3A4 3818/4885 |
| US-20100310987-A1 | POLYMER, RADIATION-SENSITIVE COMPOSITION, MONOMER, AND METHOD OF PRODUCING COMPOUND | RAD1, FRG1, RAD51 | DPP4 4830/4885ALDH1A1 973/4885CYP3A4 2391/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.