SCHEMBL13296152

SCHEMBL13296152

CC(=O)OCC(O)COC(=O)C(C)Br

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TDP1 Q9NUW8 1/20 0.42
ALDH1A1 P00352 4/20 0.39
USP2 O75604 4/20 0.39
MAPT P10636 4/20 0.39
CYP3A4 P08684 3/20 0.39
SMN1; SMN2 Q16637 2/20 0.39
HPGD P15428 1/20 0.39
MEN1 O00255 1/20 0.39
TP53 P04637 1/20 0.39
MAPK1 P28482 1/20 0.39
KMT2A Q03164 1/20 0.39
LMNA P02545 3/20 0.36
HSD17B10 Q99714 1/20 0.36
RECQL P46063 1/20 0.33
TSHR P16473 2/20 0.32
POLB P06746 1/20 0.32
NPSR1 Q6W5P4 1/20 0.32
ALOX15 P16050 1/20 0.31
ENPP2 Q13822 2/20 0.30
TRPV1 Q8NER1 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL304203 0.84 TDP1 (0.54) TDP1ALDH1A1USP2MAPTCYP3A4
SCHEMBL13296154 0.83 KDM4E (0.33) MAPTSMN1; SMN2MEN1KMT2ALMNA
SCHEMBL821544 0.83 TDP1 (0.45) TDP1ALDH1A1USP2MAPTCYP3A4
SCHEMBL15249360 0.83 TDP1 (0.45) TDP1ALDH1A1USP2MAPTCYP3A4
SCHEMBL6131221 0.78 TDP1 (0.48) TDP1ALDH1A1USP2MAPTCYP3A4
SCHEMBL19821867 0.78 TDP1 (0.41) TDP1ALDH1A1USP2MAPTCYP3A4
SCHEMBL9826996 0.77 TDP1 (0.44) TDP1ALDH1A1USP2MAPTCYP3A4
SCHEMBL23818606 0.76 TDP1 (0.47) TDP1ALDH1A1USP2MAPTCYP3A4
SCHEMBL10020242 0.76 TDP1 (0.47) TDP1ALDH1A1USP2MAPTCYP3A4
SCHEMBL13176451 0.76 TDP1 (0.47) TDP1ALDH1A1USP2MAPTCYP3A4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7736822-B2 Resist underlayer coating forming composition for mask blank, mask blank and mask HOYA CORPORATION (JP) 2010-06-15 US disclosed
US-20100081081-A1 RESIST UNDERLAYER FILM FORMING COMPOSITION FOR ELECTRON BEAM LITHOGRAPHY NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2010-04-01 US disclosed
US-20070190459-A1 Resist underlayer coating forming composition for mask blank, mask blank and mask HOYA CORPORATION (JP) 2007-08-16 US disclosed