Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.48 |
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.43 |
| ▸ | USP2 | O75604 | 4/20 | 0.43 |
| ▸ | MAPT | P10636 | 4/20 | 0.43 |
| ▸ | CYP3A4 | P08684 | 3/20 | 0.43 |
| ▸ | SMN1; SMN2 | Q16637 | 3/20 | 0.43 |
| ▸ | HPGD | P15428 | 1/20 | 0.43 |
| ▸ | MEN1 | O00255 | 1/20 | 0.43 |
| ▸ | TP53 | P04637 | 1/20 | 0.43 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.43 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.43 |
| ▸ | LMNA | P02545 | 4/20 | 0.42 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.42 |
| ▸ | TSHR | P16473 | 1/20 | 0.39 |
| ▸ | KDM4E | B2RXH2 | 3/20 | 0.38 |
| ▸ | RECQL | P46063 | 1/20 | 0.37 |
| ▸ | POLB | P06746 | 1/20 | 0.35 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.35 |
| ▸ | PGR | P06401 | 1/20 | 0.34 |
| ▸ | CHRM2 | P08172 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL304203 | 0.92 | TDP1 (0.54) | TDP1ALDH1A1USP2MAPTCYP3A4 | |
| SCHEMBL15096923 | 0.89 | ALDH1A1 (0.50) | TDP1ALDH1A1USP2MAPTCYP3A4 | |
| SCHEMBL17480802 | 0.88 | TDP1 (0.48) | TDP1ALDH1A1USP2MAPTCYP3A4 | |
| SCHEMBL14528315 | 0.87 | HSD17B10 (0.50) | TDP1ALDH1A1USP2MAPTCYP3A4 | |
| Hydroquinone SCHEMBL6353777 | 0.86 | ADRB2 (0.46) | TDP1ALDH1A1USP2MAPTCYP3A4 | |
| Tromethamine SCHEMBL7036899 | 0.84 | TDP1 (0.38) | TDP1ALDH1A1USP2MAPTCYP3A4 | |
| SCHEMBL17482276 | 0.83 | PRKCA (0.49) | TDP1MEN1KMT2ALMNAKDM4E | |
| SCHEMBL23818606 | 0.83 | TDP1 (0.47) | TDP1ALDH1A1USP2MAPTCYP3A4 | |
| SCHEMBL13176451 | 0.83 | TDP1 (0.47) | TDP1ALDH1A1USP2MAPTCYP3A4 | |
| SCHEMBL10020242 | 0.83 | TDP1 (0.47) | TDP1ALDH1A1USP2MAPTCYP3A4 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 102 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20030149219-A1 | Process for manufacturing a hydroxyester derivative intermediate and epoxy resins prepared therefrom | BORIACK CLINTON J (US) | 2003-08-07 | — | — | US | claimed |
| US-6534621-B2 | Epoxidizing an alpha-halohydrin intermediate produced from an in situ halide substitution-deesterification of an alpha-hydroxy ester derivative | DOW GLOBAL TECHNOLOGIES INC. | 2003-03-18 | — | — | US | claimed |
| EP-1290058-A2 | PROCESS FOR MANUFACTURING A HYDROXYESTER DERIVATIVE INTERMEDIATE AND EPOXY RESINS PREPARED THEREFROM | DOW GLOBAL TECHNOLOGIES INC. (US) | 2003-03-12 | — | — | EP | claimed |
| US-20020045707-A1 | Process for manufacturing a hydroxyester derivative intermediate and epoxy resins prepared therefrom | DOW GLOBAL TECHNOLOGIES INC. | 2002-04-18 | — | — | US | claimed |
| WO-2001088013-A2 | PROCESS FOR MANUFACTURING A HYDROXYESTER DERIVATIVE INTERMEDIATE AND EPOXY RESINS PREPARED THEREFROM | DOW GLOBAL TECHNOLOGIES INC (US) | 2001-11-22 | — | — | WO | claimed |
| US-12638775-B2 | Methods and compositions for improved patterning of photoresist | TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TW) | 2026-05-26 | — | — | US | disclosed |
| US-20250224673-A1 | PHOTORESIST AND METHOD OF FORMATION AND USE | TAIWAN SEMICONDUCTOR MFG CO LTD (TW) | 2025-07-10 | — | — | US | disclosed |
| US-12287575-B2 | Photoresist and method of formation and use | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2025-04-29 | — | — | US | disclosed |
| US-20240393685-A1 | SEMICONDUCTOR DEVICE AND METHODS OF MANUFACTURE | TAIWAN SEMICONDUCTOR MFG CO LTD (TW) | 2024-11-28 | — | — | US | disclosed |
| US-20240387193-A1 | SEMICONDUCTOR DEVICES WITH EXTERNAL CONNECTORS | TAIWAN SEMICONDUCTOR MFG CO LTD (TW) | 2024-11-21 | — | — | US | disclosed |
| US-20240371640-A1 | UNDERLAYER OF MULTILAYER STRUCTURE AND METHODS OF USE THEREOF | TAIWAN SEMICONDUCTOR MFG CO LTD (TW) | 2024-11-07 | — | — | US | disclosed |
| CN-111863601-B | Method for manufacturing semiconductor device and photoresist | 台湾积体电路制造股份有限公司 | 2024-08-27 | — | — | CN | disclosed |
| US-20050165201-A1 | Epoxidizing an alpha-halohydrin intermediate from a halide substitution-deesterification of an alpha -hydroxy ester derivative obtained by the coupling reaction of a phenol and a glycidyl ester | BORIACK CLINTON J (US) | 2005-07-28 | — | — | US | disclosed |
| US-6881529-B2 | Positive photoresist transfer material and method for processing surface of substrate using the transfer material | FUJI PHOTO FILM CO., LTD. (JP) | 2005-04-19 | — | — | US | disclosed |
| US-20030149219-A1 | Process for manufacturing a hydroxyester derivative intermediate and epoxy resins prepared therefrom | BORIACK CLINTON J (US) | 2003-08-07 | — | — | US | disclosed |
| US-20030087179-A1 | Positive photoresist transfer material and method for processing surface of substrate using the transfer material | FUJI PHOTO FILM CO., LTD. | 2003-05-08 | — | — | US | disclosed |
| US-6534621-B2 | Epoxidizing an alpha-halohydrin intermediate produced from an in situ halide substitution-deesterification of an alpha-hydroxy ester derivative | DOW GLOBAL TECHNOLOGIES INC. | 2003-03-18 | — | — | US | disclosed |
| EP-1290058-A2 | PROCESS FOR MANUFACTURING A HYDROXYESTER DERIVATIVE INTERMEDIATE AND EPOXY RESINS PREPARED THEREFROM | DOW GLOBAL TECHNOLOGIES INC. (US) | 2003-03-12 | — | — | EP | disclosed |
| US-20020045707-A1 | Process for manufacturing a hydroxyester derivative intermediate and epoxy resins prepared therefrom | DOW GLOBAL TECHNOLOGIES INC. | 2002-04-18 | — | — | US | disclosed |
| WO-2001088013-A2 | PROCESS FOR MANUFACTURING A HYDROXYESTER DERIVATIVE INTERMEDIATE AND EPOXY RESINS PREPARED THEREFROM | DOW GLOBAL TECHNOLOGIES INC (US) | 2001-11-22 | — | — | WO | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-12638775-B2 | Methods and compositions for improved patterning of photoresist | DSG1, SCO2, ERCC1 | TDP1 295/4885ALDH1A1 1401/4885USP2 3865/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.