⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3481468 | 0.79 | — | — | |
| SCHEMBL15150843 | 0.71 | — | — | |
| SCHEMBL296997 | 0.71 | — | — | |
| SCHEMBL30621360 | 0.67 | — | — | |
| SCHEMBL16154018 | 0.65 | — | — | |
| SCHEMBL28966194 | 0.65 | — | — | |
| SCHEMBL28966216 | 0.62 | — | — | |
| SCHEMBL19800889 | 0.61 | — | — | |
| SCHEMBL28966210 | 0.60 | — | — | |
| SCHEMBL235048 | 0.58 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8765233-B2 | Method for forming low-carbon CVD film for filling trenches | ASM JAPAN K.K. (JP) | 2014-07-01 | — | — | US | disclosed |
| US-20100143609-A1 | METHOD FOR FORMING LOW-CARBON CVD FILM FOR FILLING TRENCHES | ASM JAPAN K.K. (JP) | 2010-06-10 | — | — | US | disclosed |