⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13301491 | 0.79 | — | — | |
| SCHEMBL30621360 | 0.77 | — | — | |
| SCHEMBL296997 | 0.71 | — | — | |
| SCHEMBL235048 | 0.67 | — | — | |
| SCHEMBL28173733 | 0.67 | — | — | |
| SCHEMBL2271925 | 0.67 | — | — | |
| SCHEMBL708104 | 0.64 | — | — | |
| SCHEMBL4528629 | 0.62 | — | — | |
| SCHEMBL28838315 | 0.61 | — | — | |
| SCHEMBL68461 | 0.61 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 53 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3023514-B1 | SILICON-BASED FILMS AND METHODS OF FORMING THE SAME | VERSUM MAT US LLC (US) | 2023-10-25 | — | — | EP | claimed |
| US-20180119276-A1 | Silicon-Based Films and Methods of Forming the Same | VERSUM MATERIALS US, LLC (US) | 2018-05-03 | — | — | US | claimed |
| US-9879340-B2 | Silicon-based films and methods of forming the same | VERSUM MATERIALS US, LLC (US) | 2018-01-30 | — | — | US | claimed |
| EP-3023514-A1 | SILICON-BASED FILMS AND METHODS OF FORMING THE SAME | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2016-05-25 | — | — | EP | claimed |
| US-20160122869-A1 | SILICON-BASED FILMS AND METHODS OF FORMING THE SAME | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2016-05-05 | — | — | US | claimed |
| JP-6157763-A | — | — | None | — | — | JP | disclosed |
| JP-6157762-A | — | — | None | — | — | JP | disclosed |
| US-20250289834-A1 | SILICON COMPOUND AND METHOD OF PRODUCING SILICON-CONTAINING THIN FILM USING THE SAME | DNF CO., LTD. (KR) | 2025-09-18 | — | — | US | disclosed |
| CN-116180042-B | Silicon-based film and method for forming the same | 弗萨姆材料美国有限责任公司 | 2025-03-18 | — | — | CN | disclosed |
| EP-3023514-B1 | SILICON-BASED FILMS AND METHODS OF FORMING THE SAME | VERSUM MAT US LLC (US) | 2023-10-25 | — | — | EP | disclosed |
| CN-116180042-A | Silicon-based film and method for forming the same | 弗萨姆材料美国有限责任公司 | 2023-05-30 | — | — | CN | disclosed |
| US-10422034-B2 | Silicon-based films and methods of forming the same | VERSUM MATERIALS US, LLC (US) | 2019-09-24 | — | — | US | disclosed |
| US-20080276836-A1 | Composition containing anti-misting component of reduced molecular weight and viscosity | MOMENTIVE PERFORMANCE MATERIALS INC. | 2008-11-13 | — | — | US | disclosed |
| WO-2008027497-A2 | BRANCHED POLYSILOXANE COMPOSITION | MOMENTIVE PERFORMANCE MATERIALS INC. (US) | 2008-03-06 | — | — | WO | disclosed |
| US-20080058491-A1 | Branched polysiloxane composition | GENERAL ELECTRIC COMPANY (US) | 2008-03-06 | — | — | US | disclosed |
| WO-2008027494-A2 | COMPOSITION CONTAINING ANTI-MISTING COMPONENT | MOMENTIVE PERFORMANCE MATERIALS INC. (US) | 2008-03-06 | — | — | WO | disclosed |
| US-20080058479-A1 | Composition containing anti-misting component | GENERAL ELECTRIC COMPANY (US) | 2008-03-06 | — | — | US | disclosed |
| US-6133396-A | NON-PYROPHORIC POLYMETHYLSILANE COMPRISING DEHALOCOUPLED DICHLOROMETHYLSILANE | THE REGENTS OF THE UNIVERSITY OF MICHIGAN (US) | 2000-10-17 | — | — | US | disclosed |
| JP-H06157762-A | ORGANOSILICON COPOLYMER, ITS PRODUCTION AND PRODUCTION OF SILICON CARBIDE | TONEN CORP | 1994-06-07 | — | — | JP | disclosed |
| JP-H06157763-A | ORGANOSILICON COPOLYMER, ITS PRODUCTION AND PRODUCTION OF SILICON CARBIDE | TONEN CORP | 1994-06-07 | — | — | JP | disclosed |