SCHEMBL13614022

SCHEMBL13614022

CCC(C)(C)C(=O)OCOC12CCC(CC1)C2

nearest known ligand 0.32

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
HMGCR P04035 2/20 0.32
RIPK1 Q13546 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL785969 0.85 ALDH1A1 (0.36)
SCHEMBL17195533 0.79 HSD11B1 (0.36)
SCHEMBL13330726 0.77 ALDH1A1 (0.33) HMGCR
SCHEMBL2734981 0.77 EPHX2 (0.35)
SCHEMBL21413067 0.77 ALDH1A1 (0.35)
SCHEMBL2734959 0.75 EPHX2 (0.39)
SCHEMBL14448399 0.74 HMGCR (0.31) HMGCRRIPK1
SCHEMBL6368482 0.73 HMGCR (0.35) HMGCR
SCHEMBL2734983 0.73 EPHX2 (0.43)
SCHEMBL13538906 0.71 TSHR (0.32)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8795942-B2 Positive resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-08-05 US disclosed
US-7611821-B2 Positive resist compositions and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2009-11-03 US disclosed
US-20080153030-A1 Positive resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2008-06-26 US disclosed
US-20080008961-A1 POSITIVE RESIST COMPOSITIONS AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2008-01-10 US disclosed