SCHEMBL13345280

SCHEMBL13345280

CCCC(C)(CC)C(=O)OC1CCC(C(C)(C)C)CC1

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
APOBEC3A P31941 1/20 0.43
APOBEC3G Q9HC16 1/20 0.43
SMN1; SMN2 Q16637 2/20 0.43
NPC1 O15118 1/20 0.43
RAB9A P51151 1/20 0.43
HTT P42858 3/20 0.43
KDM4E B2RXH2 1/20 0.43
CYP19A1 P11511 1/20 0.42
MAPT P10636 2/20 0.41
GAA P10253 1/20 0.39
HSD11B1 P28845 1/20 0.34
CHRM3 P20309 2/20 0.33
LIPA P38571 1/20 0.33
MLNR O43193 1/20 0.33
CHRM2 P08172 1/20 0.33
CHRM1 P11229 1/20 0.33
HTR2A P28223 1/20 0.33
HTR2C P28335 1/20 0.33
HRH1 P35367 1/20 0.33
OPRM1 P35372 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18373347 0.90 APOBEC3A (0.48) APOBEC3AAPOBEC3GSMN1; SMN2NPC1RAB9A
SCHEMBL23609557 0.84 SMN1; SMN2 (0.32) APOBEC3AAPOBEC3GSMN1; SMN2NPC1RAB9A
SCHEMBL21677330 0.84 NAAA (0.45) SMN1; SMN2NPC1RAB9AHTTKDM4E
SCHEMBL14950164 0.82 APOBEC3A (0.42) APOBEC3AAPOBEC3GSMN1; SMN2NPC1RAB9A
SCHEMBL133266 0.81 APOBEC3A (0.41) APOBEC3AAPOBEC3GSMN1; SMN2NPC1RAB9A
SCHEMBL133127 0.81 APOBEC3A (0.41) APOBEC3AAPOBEC3GSMN1; SMN2NPC1RAB9A
SCHEMBL107668 0.80 APOBEC3A (0.48) APOBEC3AAPOBEC3GSMN1; SMN2NPC1RAB9A
SCHEMBL10247276 0.79 APOBEC3A (0.42) APOBEC3AAPOBEC3GSMN1; SMN2NPC1RAB9A
SCHEMBL12320938 0.79 APOBEC3A (0.42) APOBEC3AAPOBEC3GSMN1; SMN2NPC1RAB9A
SCHEMBL24961309 0.79 NAAA (0.40) APOBEC3AAPOBEC3GSMN1; SMN2NPC1RAB9A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2010067905-A2 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2010-06-17 WO disclosed