Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP2C19 | P33261 | 2/20 | 0.43 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.43 |
| ▸ | ELANE | P08246 | 1/20 | 0.40 |
| ▸ | MAPT | P10636 | 3/20 | 0.37 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.37 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.37 |
| ▸ | CYP2D6 | P10635 | 2/20 | 0.37 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.37 |
| ▸ | CHRM2 | P08172 | 2/20 | 0.36 |
| ▸ | CHRM1 | P11229 | 2/20 | 0.36 |
| ▸ | CHRM3 | P20309 | 2/20 | 0.36 |
| ▸ | CHRM4 | P08173 | 1/20 | 0.36 |
| ▸ | CHRM5 | P08912 | 1/20 | 0.36 |
| ▸ | KCNN4 | O15554 | 1/20 | 0.36 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.35 |
| ▸ | THRB | P10828 | 1/20 | 0.35 |
| ▸ | HDAC3 | O15379 | 1/20 | 0.35 |
| ▸ | HDAC4 | P56524 | 1/20 | 0.35 |
| ▸ | HDAC1 | Q13547 | 1/20 | 0.35 |
| ▸ | HDAC7 | Q8WUI4 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL15188011 | 0.88 | CYP2C19 (0.41) | CYP2C19HIF1AELANEMAPTALDH1A1 | |
| SCHEMBL14827348 | 0.86 | MAPT (0.41) | MAPTKMT2ATHRB | |
| SCHEMBL14827342 | 0.86 | KDM4E (0.38) | CYP2C19MAPTALDH1A1CYP1A2KMT2A | |
| SCHEMBL14828592 | 0.86 | NPSR1 (0.40) | CYP2C19MAPTALDH1A1CYP1A2KMT2A | |
| SCHEMBL15168704 | 0.85 | CYP2C19 (0.39) | CYP2C19HIF1AELANEMAPTALDH1A1 | |
| SCHEMBL24110667 | 0.84 | THRB (0.33) | THRB | |
| SCHEMBL18408916 | 0.83 | CYP2C19 (0.48) | CYP2C19HIF1AMAPTALDH1A1CYP1A2 | |
| SCHEMBL5571854 | 0.83 | CYP2C19 (0.48) | CYP2C19HIF1AMAPTALDH1A1CYP1A2 | |
| SCHEMBL27491440 | 0.83 | TSHR (0.42) | CYP2C19HIF1AALDH1A1THRB | |
| SCHEMBL6850505 | 0.82 | CYP2C19 (0.41) | CYP2C19HIF1AELANEMAPTALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4267708-B1 | THERMALLY RESPONSIVE BRUSH POLYMERS HAVING A COPOLYMER BACKBONE AND COPOLYMER ARMS | INFINEUM INT LTD (GB) | 2025-07-02 | — | — | EP | disclosed |
| US-12281203-B2 | Thermally responsive brush polymers having a copolymer backbone and copolymer arms | INFINEUM INTERNATIONAL LIMITED (GB) | 2025-04-22 | — | — | US | disclosed |
| US-20240309155-A1 | Thermally Responsive Brush Polymers Having a Copolymer Backbone and Copolymer Arms | INFINEUM INTERNATIONAL LIMITED (GB) | 2024-09-19 | — | — | US | disclosed |
| US-20230305398-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-09-28 | — | — | US | disclosed |
| US-20230305398-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-09-28 | — | — | US | disclosed |
| US-20200117087-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2020-04-16 | — | — | US | disclosed |
| US-20190243244-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2019-08-08 | — | — | US | disclosed |
| US-9182662-B2 | Photosensitive copolymer, photoresist comprising the copolymer, and articles formed therefrom | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2015-11-10 | — | — | US | disclosed |
| US-8968979-B2 | Positive resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-03-03 | — | — | US | disclosed |
| US-8968979-B2 | Positive resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-03-03 | — | — | US | disclosed |
| US-20130209934-A1 | PHOTOSENSITIVE COPOLYMER, PHOTORESIST COMPRISING THE COPOLYMER, AND ARTICLES FORMED THEREFROM | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2013-08-15 | — | — | US | disclosed |
| US-20100129738-A1 | POSITIVE RESIST COMPOSITION AND PATTERING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-05-27 | — | — | US | disclosed |
| US-20100129738-A1 | POSITIVE RESIST COMPOSITION AND PATTERING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-05-27 | — | — | US | disclosed |