Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.41 |
| ▸ | SMN1; SMN2 | Q16637 | 3/20 | 0.41 |
| ▸ | NPC1 | O15118 | 2/20 | 0.41 |
| ▸ | RAB9A | P51151 | 2/20 | 0.41 |
| ▸ | KDM4E | B2RXH2 | 4/20 | 0.39 |
| ▸ | MEN1 | O00255 | 4/20 | 0.39 |
| ▸ | KMT2A | Q03164 | 4/20 | 0.39 |
| ▸ | HPGD | P15428 | 3/20 | 0.39 |
| ▸ | GLA | P06280 | 2/20 | 0.39 |
| ▸ | CES2 | O00748 | 1/20 | 0.39 |
| ▸ | CES1 | P23141 | 1/20 | 0.39 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.39 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.39 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.39 |
| ▸ | PPARG | P37231 | 2/20 | 0.39 |
| ▸ | PPARA | Q07869 | 2/20 | 0.39 |
| ▸ | HDAC3 | O15379 | 2/20 | 0.39 |
| ▸ | HDAC1 | Q13547 | 2/20 | 0.39 |
| ▸ | HDAC2 | Q92769 | 2/20 | 0.39 |
| ▸ | MAPT | P10636 | 2/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Biphenyl SCHEMBL15709516 | 0.83 | MAPT (0.53) | ALDH1A1SMN1; SMN2KDM4EHPGDCES2 | |
| Diphenylether SCHEMBL30629351 | 0.82 | LTA4H (0.47) | ALDH1A1SMN1; SMN2NPC1RAB9AHPGD | |
| Phenol SCHEMBL16857563 | 0.82 | CA12 (0.46) | ALDH1A1SMN1; SMN2KDM4EGLACES2 | |
| Biphenyl SCHEMBL28111255 | 0.82 | MAPT (0.52) | ALDH1A1SMN1; SMN2KDM4EMEN1KMT2A | |
| Anthracene SCHEMBL2354665 | 0.81 | FFAR3 (0.50) | ALDH1A1SMN1; SMN2NPC1RAB9AKDM4E | |
| Anthracene SCHEMBL4231335 | 0.81 | FFAR3 (0.50) | ALDH1A1SMN1; SMN2NPC1RAB9AKDM4E | |
| Benzene SCHEMBL27779803 | 0.80 | FFAR3 (0.40) | ALDH1A1SMN1; SMN2MEN1KMT2ACES2 | |
| Benzene SCHEMBL28224395 | 0.80 | FFAR3 (0.40) | ALDH1A1SMN1; SMN2MEN1KMT2ACES2 | |
| SCHEMBL5704867 | 0.80 | KMO (0.42) | SMN1; SMN2HDAC2MAPTL3MBTL1 | |
| Benzenethiol SCHEMBL5474808 | 0.80 | CES2 (0.39) | ALDH1A1SMN1; SMN2MEN1KMT2AGLA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2024024687-A1 | PHOTOCURABLE COMPOSITION, CURED PRODUCT OF PHOTOCURABLE COMPOSITION, AND LIGHT EMITTING DISPLAY DEVICE | デンカ株式会社 | 2024-02-01 | — | — | WO | disclosed |
| US-9733564-B2 | Copolymers for lithography and method for producing same, resist composition, method for producing substrate with pattern formed thereupon, method for evaluating copolymers, and method for analyzing copolymer compositions | MITSUBISHI CHEMICAL CORPORATION (JP) | 2017-08-15 | — | — | US | disclosed |
| US-9296842-B2 | Polymer for lithography | MITSUBISHI RAYON CO., LTD. (JP) | 2016-03-29 | — | — | US | disclosed |
| US-9109060-B2 | Method for producing polymer, polymer for lithography, resist composition, and method for producing substrate | MITSUBISHI RAYON, CO., LTD. (JP) | 2015-08-18 | — | — | US | disclosed |
| US-8795858-B2 | Magnetic recording medium and method of manufacturing the same | FUJIFILM CORPORATION (JP) | 2014-08-05 | — | — | US | disclosed |
| US-8632896-B2 | Radiation-curable vinyl chloride copolymer, radiation-curable composition, and magnetic recording medium | FUJIFILM CORPORATION (JP) | 2014-01-21 | — | — | US | disclosed |
| US-8617728-B2 | Magnetic tape and method of manufacturing the same | FUJIFILM CORPORATION (JP) | 2013-12-31 | — | — | US | disclosed |
| US-20130331533-A1 | POLYMER FOR LITHOGRAPHY | MITSUBISHI RAYON CO., LTD. (JP) | 2013-12-12 | — | — | US | disclosed |
| US-8603652-B2 | Magnetic recording medium | FUJIFILM CORPORATION (JP) | 2013-12-10 | — | — | US | disclosed |
| US-20130224654-A1 | COPOLYMERS FOR LITHOGRAPHY AND METHOD FOR PRODUCING SAME, RESIST COMPOSITION, METHOD FOR PRODUCING SUBSTRATE WITH PATTERN FORMED THEREUPON, METHOD FOR EVALUATING COPOLYMERS, AND METHOD FOR ANALYZING COPOLYMER COMPOSITIONS | MITSUBISHI RAYON CO., LTD. (JP) | 2013-08-29 | — | — | US | disclosed |
| US-20120115086-A1 | METHOD FOR PRODUCING POLYMER, POLYMER FOR LITHOGRAPHY, RESIST COMPOSITION, AND METHOD FOR PRODUCING SUBSTRATE | MITSUBISHI RAYON CO., LTD. (JP) | 2012-05-10 | — | — | US | disclosed |
| US-20110274947-A1 | MAGNETIC RECORDING MEDIUM | FUJIFILM CORPORATION (JP) | 2011-11-10 | — | — | US | disclosed |
| US-20110229741-A1 | MAGNETIC RECORDING MEDIUM AND METHOD OF MANUFACTURING THE SAME | FUJIFILM CORPORATION (JP) | 2011-09-22 | — | — | US | disclosed |
| US-20110111258-A1 | RADIATION-CURABLE VINYL CHLORIDE COPOLYMER, RADIATION-CURABLE COMPOSITION, AND MAGNETIC RECORDING MEDIUM | FUJIFILM CORPORATION (JP) | 2011-05-12 | — | — | US | disclosed |
| US-20090035704-A1 | Underlayer Coating Composition Based on a Crosslinkable Polymer | AZ ELECTRONIC MATERIALS USA CORP. | 2009-02-05 | — | — | US | disclosed |