SCHEMBL13396174

SCHEMBL13396174

C=C(C)C(=O)OCC(=O)OC1CC2C(=O)OCC2CC1OC

nearest known ligand 0.35

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10203327 0.87 GPX4 (0.33) ALDH1A1
SCHEMBL13395831 0.80 ALDH1A1 (0.36) ALDH1A1
SCHEMBL19465122 0.80 ALDH1A1 (0.36) ALDH1A1
SCHEMBL6691314 0.77 ALDH1A1 (0.32) ALDH1A1
SCHEMBL6467663 0.76 ALDH1A1 (0.35) ALDH1A1
SCHEMBL12325997 0.73 ALDH1A1 (0.33) ALDH1A1
SCHEMBL3802175 0.72 ALDH1A1 (0.39) ALDH1A1
SCHEMBL14838639 0.71 ALDH1A1 (0.34) ALDH1A1
SCHEMBL685118 0.71 ALDH1A1 (0.41) ALDH1A1
SCHEMBL13380563 0.70 ALDH1A1 (0.34) ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20100081086-A1 POSITIVE RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND POLYMERIC COMPOUND TOKYO OHKA KOGYO CO., LTD. (JP) 2010-04-01 US disclosed