Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.49 |
| ▸ | FOXM1 | Q08050 | 1/20 | 0.45 |
| ▸ | NPC1 | O15118 | 1/20 | 0.43 |
| ▸ | PKM | P14618 | 1/20 | 0.43 |
| ▸ | EPHX2 | P34913 | 1/20 | 0.43 |
| ▸ | RAB9A | P51151 | 1/20 | 0.43 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.43 |
| ▸ | TSHR | P16473 | 1/20 | 0.42 |
| ▸ | KCNA3 | P22001 | 1/20 | 0.40 |
| ▸ | ADRB2 | P07550 | 1/20 | 0.38 |
| ▸ | ADRB1 | P08588 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL23074695 | 1.00 | ALDH1A1 (0.49) | ALDH1A1FOXM1NPC1PKMEPHX2 | |
| SCHEMBL23074671 | 0.91 | ALDH1A1 (0.53) | ALDH1A1NPC1PKMEPHX2RAB9A | |
| SCHEMBL2352960 | 0.82 | ALDH1A1 (0.49) | ALDH1A1NPC1PKMEPHX2RAB9A | |
| SCHEMBL13406716 | 0.75 | TSHR (0.60) | ALDH1A1TSHRKCNA3ADRB2ADRB1 | |
| SCHEMBL23074644 | 0.75 | KDM4E (0.51) | ALDH1A1 | |
| SCHEMBL23074699 | 0.75 | ALDH1A1 (0.43) | ALDH1A1TSHR | |
| SCHEMBL23074697 | 0.75 | HTR2A (0.47) | ALDH1A1SMN1; SMN2 | |
| SCHEMBL23074662 | 0.75 | LTA4H (0.50) | ALDH1A1NPC1PKMEPHX2RAB9A | |
| SCHEMBL23074701 | 0.75 | ALDH1A1 (0.43) | ALDH1A1TSHR | |
| SCHEMBL23074677 | 0.75 | HRH3 (0.50) | ALDH1A1RAB9ASMN1; SMN2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7691560-B2 | Resist composition and pattern forming method using the same | FUJIFILM CORPORATION (JP) | 2010-04-06 | — | — | US | disclosed |
| US-7691560-B2 | Resist composition and pattern forming method using the same | FUJIFILM CORPORATION (JP) | 2010-04-06 | — | — | US | disclosed |
| US-20070224539-A1 | Resist composition and pattern forming method using the same | FUJIFILM CORPORATION (JP) | 2007-09-27 | — | — | US | disclosed |
| US-20070224539-A1 | Resist composition and pattern forming method using the same | FUJIFILM CORPORATION (JP) | 2007-09-27 | — | — | US | disclosed |