SCHEMBL13406723

SCHEMBL13406723

COCCN(CCOC)CCOCCOc1ccccc1

nearest known ligand 0.53

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
▸ PKM P14618 1/20 0.46
▸ TSHR P16473 1/20 0.46
▸ KCNA3 P22001 1/20 0.45
▸ MEN1 O00255 2/20 0.45
▸ KMT2A Q03164 2/20 0.45
▸ LTA4H P09960 2/20 0.45
▸ ALDH1A1 P00352 1/20 0.44
▸ KDM4E B2RXH2 3/20 0.44
▸ CYP1A2 P05177 1/20 0.44
▸ CYP2D6 P10635 1/20 0.44
▸ CYP2C9 P11712 1/20 0.44
▸ CYP2C19 P33261 1/20 0.44
▸ HTT P42858 1/20 0.44
▸ RECQL P46063 1/20 0.44
▸ MAPT P10636 1/20 0.42
▸ RAB9A P51151 1/20 0.42
▸ SMN1; SMN2 Q16637 1/20 0.42
▸ ADRB2 P07550 1/20 0.42
▸ ADRB1 P08588 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13406724 1.00 PKM (0.46) PKMTSHRKCNA3MEN1KMT2A
SCHEMBL13439615 0.93 LTA4H (0.49) PKMTSHRKCNA3MEN1KMT2A
SCHEMBL13406715 0.91 KCNA3 (0.54) PKMTSHRKCNA3MEN1KMT2A
SCHEMBL13406719 0.89 KCNA3 (0.52) PKMTSHRKCNA3MEN1KMT2A
SCHEMBL12850187 0.86 TSHR (0.52) TSHRKCNA3LTA4HKDM4ECYP1A2
SCHEMBL12850076 0.86 TSHR (0.49) TSHRKCNA3LTA4HALDH1A1KDM4E
SCHEMBL1535614 0.85 KCNA3 (0.56) PKMKCNA3MEN1KMT2ALTA4H
SCHEMBL22297235 0.85 KCNA3 (0.56) PKMKCNA3MEN1KMT2ALTA4H
SCHEMBL5897061 0.85 KCNA3 (0.56) PKMKCNA3MEN1KMT2ALTA4H
SCHEMBL10711044 0.85 KCNA3 (0.56) PKMKCNA3MEN1KMT2ALTA4H

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7691560-B2 Resist composition and pattern forming method using the same FUJIFILM CORPORATION (JP) 2010-04-06 — — US disclosed
US-7691560-B2 Resist composition and pattern forming method using the same FUJIFILM CORPORATION (JP) 2010-04-06 — — US disclosed
US-20070224539-A1 Resist composition and pattern forming method using the same FUJIFILM CORPORATION (JP) 2007-09-27 — — US disclosed
US-20070224539-A1 Resist composition and pattern forming method using the same FUJIFILM CORPORATION (JP) 2007-09-27 — — US disclosed
EP-1837704-A2 Resist composition and pattern forming method using the same FUJIFILM Corporation (JP) 2007-09-26 — — EP disclosed
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