SCHEMBL13439615

SCHEMBL13439615

COCCOCCN(CCOCCOC)CCOc1ccccc1

nearest known ligand 0.53

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ LTA4H P09960 3/20 0.49
▸ CYP2D6 P10635 2/20 0.47
▸ CYP1A2 P05177 1/20 0.47
▸ CYP2C9 P11712 1/20 0.47
▸ CYP2C19 P33261 1/20 0.47
▸ HTT P42858 1/20 0.47
▸ KMT2A Q03164 3/20 0.45
▸ MEN1 O00255 2/20 0.45
▸ KDM4E B2RXH2 1/20 0.45
▸ SMN1; SMN2 Q16637 1/20 0.45
▸ KCNA3 P22001 1/20 0.45
▸ KCNH2 Q12809 2/20 0.44
▸ TSHR P16473 2/20 0.43
▸ PKM P14618 1/20 0.42
▸ HTR1D P28221 1/20 0.42
▸ HTR1B P28222 1/20 0.42
▸ EBP Q15125 2/20 0.41
▸ SIGMAR1 Q99720 2/20 0.41
▸ IDH1 O75874 1/20 0.41
▸ EGFR P00533 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13406723 0.93 PKM (0.46) LTA4HCYP2D6CYP1A2CYP2C9CYP2C19
SCHEMBL13406724 0.93 PKM (0.46) LTA4HCYP2D6CYP1A2CYP2C9CYP2C19
SCHEMBL13406719 0.89 KCNA3 (0.52) LTA4HCYP2D6CYP1A2CYP2C9CYP2C19
SCHEMBL13406721 0.89 KMT2A (0.44) LTA4HCYP2D6CYP1A2CYP2C9CYP2C19
SCHEMBL13406715 0.87 KCNA3 (0.54) LTA4HCYP2D6CYP1A2CYP2C9CYP2C19
SCHEMBL13406720 0.86 LTA4H (0.51) LTA4HCYP2D6CYP1A2CYP2C9CYP2C19
SCHEMBL5897061 0.85 KCNA3 (0.56) LTA4HKMT2AMEN1KDM4EKCNA3
SCHEMBL22297235 0.85 KCNA3 (0.56) LTA4HKMT2AMEN1KDM4EKCNA3
SCHEMBL1535614 0.85 KCNA3 (0.56) LTA4HKMT2AMEN1KDM4EKCNA3
SCHEMBL10711044 0.85 KCNA3 (0.56) LTA4HKMT2AMEN1KDM4EKCNA3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7691560-B2 Resist composition and pattern forming method using the same FUJIFILM CORPORATION (JP) 2010-04-06 — — US disclosed
US-20070224539-A1 Resist composition and pattern forming method using the same FUJIFILM CORPORATION (JP) 2007-09-27 — — US disclosed
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