⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL23243610 | 0.85 | — | — | |
| SCHEMBL972471 | 0.83 | — | — | |
| SCHEMBL15182783 | 0.82 | ALDH1A1 (0.30) | — | |
| SCHEMBL15182784 | 0.82 | ALDH1A1 (0.30) | — | |
| SCHEMBL2273674 | 0.82 | — | — | |
| SCHEMBL13137384 | 0.80 | — | — | |
| SCHEMBL16169615 | 0.79 | — | — | |
| SCHEMBL20536297 | 0.78 | — | — | |
| SCHEMBL422241 | 0.77 | DNM1 (0.33) | — | |
| SCHEMBL14328008 | 0.76 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 172 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11631580-B2 | Formulation for deposition of silicon doped hafnium oxide as ferroelectric materials | VERSUM MATERIALS US, LLC (US) | 2023-04-18 | — | — | US | claimed |
| US-20220189767-A1 | FORMULATION FOR DEPOSITION OF SILICON DOPED HAFNIUM OXIDE AS FERROELECTRIC MATERIALS | VERSUM MATERIALS US, LLC (US) | 2022-06-16 | — | — | US | claimed |
| US-11081337-B2 | Formulation for deposition of silicon doped hafnium oxide as ferroelectric materials | Versum Materials U.S., LLC (US) | 2021-08-03 | — | — | US | claimed |
| US-20180269057-A1 | Formulation for Deposition of Silicon Doped Hafnium Oxide as Ferroelectric Materials | VERSUM MATERIALS US, LLC (US) | 2018-09-20 | — | — | US | claimed |
| WO-2018170126-A1 | NEW FORMULATION FOR DEPOSITION OF SILICON DOPED HAFNIUM OXIDE AS FERROELECTRIC MATERIALS | VERSUM MATERIALS US, LLC (US) | 2018-09-20 | — | — | WO | claimed |
| US-8062820-B2 | Toner composition and method of preparing same | CABOT CORPORATION (US) | 2011-11-22 | — | — | US | claimed |
| EP-2014797-A2 | Coating composition for interconnection part of electrode and plasma display panel including the same | Samsung SDI Co., Ltd. (KR) | 2009-01-14 | — | — | EP | claimed |
| US-20080303439-A1 | Coating composition for interconnection part of electrode and plasma display panel including the same | SAMSUNG SDI CO., LTD., A CORP. OF THE REPUBLIC OF KOREA (KR) | 2008-12-11 | — | — | US | claimed |
| WO-2007133669-A2 | TONER COMPOSITION AND METHOD OF PREPARING SAME | CABOT CORPORATION (US) | 2007-11-22 | — | — | WO | claimed |
| US-20070264502-A1 | Toner composition and method of preparing same | CABOT CORPORATION (US) | 2007-11-15 | — | — | US | claimed |
| US-20030021996-A1 | Release surfaces | GUDIMENKO YURI (CA) | 2003-01-30 | — | — | US | claimed |
| EP-0667562-B1 | Charge injection barrier for positive charging organic photoconductor | HEWLETT PACKARD CO (US) | 2001-03-21 | — | — | EP | claimed |
| EP-4080548-B1 | METHOD OF PROCESSING SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING APPARATUS, AND PROGRAM | KOKUSAI ELECTRIC CORP (JP) | 2026-04-29 | — | — | EP | disclosed |
| EP-4724526-A1 | CONDENSATION CURE SILICONE ADHESIVE | Momentive Performance Materials Inc. (US) | 2026-04-15 | — | — | EP | disclosed |
| US-12581878-B2 | Method of processing substrate, method of manufacturing semiconductor device, substrate processing apparatus, and recording medium | Kokusai Electric Corporation (JP) | 2026-03-17 | — | — | US | disclosed |
| EP-4705309-A1 | CHLOROSILYL-SUBSTITUTED SILACYCLOALKANES AND THEIR USE FOR FORMATION OF FILMS COMPRISING SILICON AND OXYGEN | Versum Materials US, LLC (US) | 2026-03-11 | — | — | EP | disclosed |
| US-5286890-A | Aromatic amine terminated silicone monomers, oligomers, and polymers therefrom | HUGHES AIRCRAFT COMPANY (US) | 1994-02-15 | — | — | US | disclosed |
| EP-0318893-B1 | Titanocenes, their use and N-substituted fluoroanilines | CIBA GEIGY AG (CH) | 1994-01-19 | — | — | EP | disclosed |
| US-5026625-A | Photoinitiators for polymerization of ethylenically unsaturated compounds | CIBA-GEIGY CORPORATION (US) | 1991-06-25 | — | — | US | disclosed |
| EP-0318893-A2 | Titanocenes, their use and N-substituted fluoroanilines | CIBA-GEIGY AG (CH) | 1989-06-07 | — | — | EP | disclosed |