⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL132525 | 0.97 | — | — | |
| SCHEMBL28213529 | 0.65 | — | — | |
| SCHEMBL9988919 | 0.64 | THRB (0.32) | — | |
| SCHEMBL9347615 | 0.63 | — | — | |
| SCHEMBL16538259 | 0.62 | — | — | |
| SCHEMBL78668 | 0.60 | — | — | |
| Isopropyl Alcohol SCHEMBL28132679 | 0.60 | ALDH1A1 (0.40) | — | |
| SCHEMBL17797447 | 0.60 | — | — | |
| Ammonia Solution, Strong SCHEMBL766637 | 0.60 | — | — | |
| Ammonia Solution, Strong SCHEMBL11504576 | 0.60 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 464 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4433436-A1 | GRINDING AID | Fosroc Yapi Kimyasallari Sanayi Ve Ticaret Anonim Sirketi (TR) | 2024-09-25 | — | — | EP | claimed |
| WO-2023104349-A1 | GRINDING AID | FOSROC YAPI KIMYASALLARI SANAYI VE TICARET ANONIM SIRKETI (TR) | 2023-06-15 | — | — | WO | claimed |
| CN-113003580-A | Large-scale synthesis method and system of fractal structure silicon dioxide ball FSN | 华东师范大学 | 2021-06-22 | — | — | CN | claimed |
| EP-3833645-A1 | EFFICIENT FORMULATION STABLE CRUDE GLYCERINE GRINDING ADDITIVE | GCP Applied Technologies Inc. (US) | 2021-06-16 | — | — | EP | claimed |
| US-20200048148-A1 | Efficient Formulation Stable Crude Glycerine Grinding Additive | GCP APPLIED TECH INC (US) | 2020-02-13 | — | — | US | claimed |
| WO-2020033935-A1 | EFFICIENT FORMULATION STABLE CRUDE GLYCERINE GRINDING ADDITIVE | GCP APPLIED TECHNOLOGIES INC. (US) | 2020-02-13 | — | — | WO | claimed |
| CN-110527084-A | A kind of poly- aspartic acid macromolecule dispersing agent of biodegradable L- structure and preparation method thereof | HEFEI BOLANGDE NANOMETER TECH CO LTD | 2019-12-03 | — | — | CN | claimed |
| CN-110475759-A | Grinding stabilization additives for vertical roll grinder | GCP APPLIED TECH INC | 2019-11-19 | — | — | CN | claimed |
| CN-110423037-A | A kind of concrete subtracts jelly and preparation method thereof | NANJING RONGFENG ENVIRONMENTAL PROTECTION TECH CO LTD | 2019-11-08 | — | — | CN | claimed |
| CN-110342848-A | A kind of retardation setting type cement grinding aid and preparation method thereof | 南京永能新材料有限公司 | 2019-10-18 | — | — | CN | claimed |
| CN-1861723-A | Silicon mono crystal substrate material polishing fluid and preparation process thereof | UNIV HEBEI POLYTECHNIC (CN) | 2006-11-15 | — | — | CN | claimed |
| CN-1861319-A | Method for controlling polishing rate of computer hard disk substrate | JINGLING MICROELECTRONICS MATE (CN) | 2006-11-15 | — | — | CN | claimed |
| CN-1858137-A | Sapphire lining material polishing liquid and its preparing method | UNIV HEBEI POLYTECHNIC (CN) | 2006-11-08 | — | — | CN | claimed |
| CN-1857864-A | Control method for high removal rate of sapphire substrate material | JINGLING MICROELECTRONIC MATER (CN) | 2006-11-08 | — | — | CN | claimed |
| CN-1858130-A | Polishing liquid for tungsten plug in large scale integrated circuit multilayer wiring | UNIV HEBEI POLYTECHNIC (CN) | 2006-11-08 | — | — | CN | claimed |
| CN-1858132-A | Polishing liquid for grinding and polishing micro crystal glass | UNIV HEBEI POLYTECHNIC (CN) | 2006-11-08 | — | — | CN | claimed |
| CN-1858134-A | Chemical and mechanical water-free polishing liquid for lithium-cessium borate crystal and leveling method | UNIV HEBEI POLYTECHNIC (CN) | 2006-11-08 | — | — | CN | claimed |
| CN-1858131-A | Polishing liquid for grinding and polishing lithium niobate optical wafer | UNIV HEBEI POLYTECHNIC (CN) | 2006-11-08 | — | — | CN | claimed |
| CN-1121060-C | Method for controlling adsorption state of particles adsorbed on surface of polished silicon substrate for integrated circuit | HEBEI PLYTECHNICAL UNIV (CN) | 2003-09-10 | — | — | CN | claimed |
| CN-1379448-A | Method for controlling adsorption state of particles adsorbed on surface of polished silicon substrate for integrated circuit | UNIV HEBEI POLYTECHNIC (CN) | 2002-11-13 | — | — | CN | claimed |