SCHEMBL135020

SCHEMBL135020

CC([CH]CCC(C)CC(C)(C)C)CC(C)(C)C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11234826 0.77
SCHEMBL277793 0.74 ALDH1A1 (0.32)
SCHEMBL277231 0.74
SCHEMBL9302609 0.74
SCHEMBL134615 0.71 TSHR (0.36)
SCHEMBL2285974 0.70 TSHR (0.30)
SCHEMBL27939771 0.70 ALOX15 (0.36)
SCHEMBL15545657 0.70
SCHEMBL8680521 0.69 LMNA (0.43)
SCHEMBL1516608 0.68 TP53 (0.33)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 78 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2816053-B1 BASE-PROTECTED OLIGONUCLEOTIDE AJINOMOTO KK (JP) 2021-03-24 EP claimed
CN-104114569-B Oligonucleotide with protected base moiety 味之素株式会社 2017-04-26 CN claimed
US-9371353-B2 Oligonucleotide with protected base AJINOMOTO CO., INC. (JP) 2016-06-21 US claimed
US-20150080565-A1 OLIGONUCLEOTIDE WITH PROTECTED BASE AJINOMOTO CO., INC. (JP) 2015-03-19 US claimed
EP-2816053-A1 BASE-PROTECTED OLIGONUCLEOTIDE Ajinomoto Co., Inc. (JP) 2014-12-24 EP claimed
CN-104114569-A Oligonucleotide with protected base moiety AJINOMOTO KK 2014-10-22 CN claimed
US-8846885-B2 Oligonucleotide with protected base AJINOMOTO CO., INC. (JP) 2014-09-30 US claimed
US-20130267697-A1 OLIGONUCLEOTIDE WITH PROTECTED BASE AJINOMOTO CO., INC. (JP) 2013-10-10 US claimed
CN-118302485-A Resin composition 日产化学株式会社 2024-07-05 CN disclosed
CN-117099046-A Photosensitive resin composition for forming insulating film 日产化学株式会社 2023-11-21 CN disclosed
WO-2023176259-A1 PHOTOSENSITIVE RESIN COMPOSITION FOR FORMING INSULATING FILM 日産化学株式会社 2023-09-21 WO disclosed
WO-2023106108-A1 PHOTOSENSITIVE RESIN COMPOSITION 日産化学株式会社 2023-06-15 WO disclosed
WO-2023106101-A1 RESIN COMPOSITION 日産化学株式会社 2023-06-15 WO disclosed
US-11643544-B2 Resin composition, and prepreg, metal-clad laminate, and printed circuit board prepared using the same TAIWAN UNION TECHNOLOGY CORPORATION (TW) 2023-05-09 US disclosed
US-5720895-A CONSISTS OF HYDROFLUOROCARBONS, A REFRIGERATION OIL CONTAINING POLYOL ETHER DERIVATIVES AS A BASE OIL KAO CORPORATION (JP) 1998-02-24 US disclosed
US-5719018-A CONTAINING SPECIFIED YELLOW DYE FORMING COUPLER; SOLUBILITY, STABILITY, FASTNESS TO LIGHT, HEAT, HUMIDITY FUJI PHOTO FILM CO., LTD. (JP) 1998-02-17 US disclosed
US-5667951-A Silver halide color photographic material containing photographic yellow dye-forming coupler FUJI PHOTO FILM CO., LTD. (JP) 1997-09-16 US disclosed
US-5612174-A AROMATIC OXO AMIDE COUPLERS FOR SILVER HALIDE EMULSIONS FUJI PHOTO FILM CO., LTD. (JP) 1997-03-18 US disclosed
EP-0739970-A1 Gas oil compositions and gas oil additives KAO CORPORATION (JP) 1996-10-30 EP disclosed
EP-0696564-A1 Polyol ether derivatives and production methods therefor KAO CORPORATION (JP) 1996-02-14 EP disclosed