Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALPG | P10696 | 2/20 | 0.41 |
| ▸ | PLAA | Q9Y263 | 1/20 | 0.41 |
| ▸ | ALPL | P05186 | 1/20 | 0.40 |
| ▸ | KMT2A | Q03164 | 5/20 | 0.39 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.39 |
| ▸ | KDM4E | B2RXH2 | 3/20 | 0.39 |
| ▸ | F2 | P00734 | 1/20 | 0.39 |
| ▸ | LMNA | P02545 | 1/20 | 0.39 |
| ▸ | HPGD | P15428 | 1/20 | 0.39 |
| ▸ | MAPT | P10636 | 2/20 | 0.38 |
| ▸ | FDPS | P14324 | 2/20 | 0.37 |
| ▸ | PDE4A | P27815 | 1/20 | 0.36 |
| ▸ | PDE4B | Q07343 | 1/20 | 0.36 |
| ▸ | PDE4C | Q08493 | 1/20 | 0.36 |
| ▸ | PDE4D | Q08499 | 1/20 | 0.36 |
| ▸ | TSHR | P16473 | 2/20 | 0.35 |
| ▸ | CA12 | O43570 | 1/20 | 0.35 |
| ▸ | CA1 | P00915 | 1/20 | 0.35 |
| ▸ | CA2 | P00918 | 1/20 | 0.35 |
| ▸ | CA3 | P07451 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Ethane SCHEMBL27625282 | 0.98 | ALPG (0.40) | ALPGPLAAALPLKMT2AALDH1A1 | |
| SCHEMBL28151261 | 0.86 | ALPG (0.40) | ALPGPLAAALPLKMT2AALDH1A1 | |
| SCHEMBL1165647 | 0.86 | ALPG (0.42) | ALPGPLAAALPLKMT2AALDH1A1 | |
| SCHEMBL2288576 | 0.86 | ALPG (0.42) | ALPGPLAAALPLKMT2AALDH1A1 | |
| SCHEMBL28746087 | 0.84 | ALPG (0.41) | ALPGPLAAALPLKMT2AALDH1A1 | |
| SCHEMBL28701458 | 0.83 | FDPS (0.39) | ALPGPLAAALPLKMT2AALDH1A1 | |
| SCHEMBL1978411 | 0.82 | AGTR1 (0.44) | KMT2AALDH1A1KDM4ELMNAHPGD | |
| SCHEMBL2427242 | 0.79 | FDPS (0.43) | ALPGPLAAALPLKMT2AALDH1A1 | |
| SCHEMBL2425586 | 0.79 | SMN1; SMN2 (0.37) | KMT2ALMNAFDPSTSHRMAPK1 | |
| SCHEMBL729229 | 0.79 | AGTR1 (0.40) | KMT2AALDH1A1LMNATSHRPOLB |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 32 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20260146026-A1 | COMPOUND, COMPOSITION, CURED PRODUCT, METHOD FOR PRODUCING CURED PRODUCT, AND METHOD FOR PRODUCING ELECTRONIC COMPONENT | ADEKA CORPORATION (JP) | 2026-05-28 | — | — | US | disclosed |
| CN-122037094-A | Block copolymer having cleavable main chain, photoresist composition comprising the same, and pattern forming method | 杜邦电子材料国际有限责任公司 | 2026-05-15 | — | — | CN | disclosed |
| EP-4610254-A1 | COMPOUND, COMPOSITION, CURED PRODUCT, METHOD FOR PRODUCING CURED PRODUCT, AND METHOD FOR PRODUCING ELECTRONIC COMPONENT | ADEKA CORPORATION (JP) | 2025-09-03 | — | — | EP | disclosed |
| CN-120019045-A | Compound, composition, cured product, method for producing cured product, and method for producing electronic component | 株式会社艾迪科 | 2025-05-16 | — | — | CN | disclosed |
| CN-114450375-B | Adhesive composition | 住友化学株式会社 | 2024-10-25 | — | — | CN | disclosed |
| US-20240352203-A1 | FILM-FORMING MATERIAL FOR SEMICONDUCTOR, MEMBER-FORMING MATERIAL FOR SEMICONDUCTOR, PROCESS MEMBER-FORMING MATERIAL FOR SEMICONDUCTOR, UNDERLAYER FILM-FORMING MATERIAL, UNDERLAYER FILM, AND SEMICONDUCTOR DEVICE | ADEKA CORPORATION (JP) | 2024-10-24 | — | — | US | disclosed |
| US-20240302742-A1 | PHOTORESIST COMPOSITION INCLUDING PHOTOSENSITIVE POLYMER AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2024-09-12 | — | — | US | disclosed |
| CN-118625595-A | Nonionic non-chemically amplified photoresist composition comprising photosensitive polymer and method of manufacturing integrated circuit device | 三星电子株式会社 | 2024-09-10 | — | — | CN | disclosed |
| US-20240241438-A1 | PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE BY USING THE SAME | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2024-07-18 | — | — | US | disclosed |
| EP-4375750-A1 | FILM-FORMING MATERIAL FOR SEMICONDUCTOR, MEMBER-FORMING MATERIAL FOR SEMICONDUCTOR, PROCESS MEMBER-FORMING MATERIAL FOR SEMICONDUCTOR, UNDERLAYER FILM-FORMING MATERIAL, UNDERLAYER FILM, AND SEMICONDUCTOR DEVICE | ADEKA CORPORATION (JP) | 2024-05-29 | — | — | EP | disclosed |
| CN-103186040-B | The formation method of the outer coating combination of photoresist and electronic equipment | ROHM AND HAAS ELECTRONIC MATERIALS CO., LTD. (US) | 2015-08-19 | — | — | CN | disclosed |
| US-8835093-B2 | Resist underlayer film forming composition containing silicon having anion group | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2014-09-16 | — | — | US | disclosed |
| US-8815494-B2 | Resist underlayer film forming composition containing silicon having anion group | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2014-08-26 | — | — | US | disclosed |
| CN-103576458-A | Photoresist composition and method of forming photolithographic pattern | ROHM & HAAS ELECT MAT | 2014-02-12 | — | — | CN | disclosed |
| CN-103186050-A | Photolithographic method | ROHM & HAAS ELECT MAT | 2013-07-03 | — | — | CN | disclosed |
| CN-103186040-A | Photoresist overcoat compositions and methods of forming electronic devices | ROHM & HAAS ELECT MAT | 2013-07-03 | — | — | CN | disclosed |
| US-20130078814-A1 | RESIST UNDERLAYER FILM FORMING COMPOSITION CONTAINING SILICON HAVING ANION GROUP | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2013-03-28 | — | — | US | disclosed |
| US-20110287369-A1 | RESIST UNDERLAYER FILM FORMING COMPOSITION CONTAINING SILICON HAVING ANION GROUP | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2011-11-24 | — | — | US | disclosed |
| EP-2372458-A1 | SILICON-CONTAINING RESIST UNDERLAYER FILM FORMATION COMPOSITION HAVING ANION GROUP | Nissan Chemical Industries, Ltd. (JP) | 2011-10-05 | — | — | EP | disclosed |
| WO-2010134830-A1 | TRITERPENOID DERIVATIVES USEFUL AS ANTIPROLIFERATIVE AGENTS | UNIVERSIDADE DE COIMBRA (PT) | 2010-11-25 | — | — | WO | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20260146026-A1 | COMPOUND, COMPOSITION, CURED PRODUCT, METHOD FOR PRODUCING CURED PRODUCT, AND METHOD FOR PRODUCING ELECTRONIC COMPONENT | CBR3, CBR1, NOTUM | ALPG 2377/4885PLAA 4180/4885ALPL 3931/4885 |
| US-20240352203-A1 | FILM-FORMING MATERIAL FOR SEMICONDUCTOR, MEMBER-FORMING MATERIAL FOR SEMICONDUCTOR, PROCESS MEMBER-FORMING MATERIAL FOR SEMICONDUCTOR, UNDERLAYER FILM-FORMING MATERIAL, UNDERLAYER FILM, AND SEMICONDUCTOR DEVICE | FBXL19, SRSF9, CNOT9 | ALPG 4213/4885PLAA 4386/4885ALPL 4648/4885 |
| US-20110287369-A1 | RESIST UNDERLAYER FILM FORMING COMPOSITION CONTAINING SILICON HAVING ANION GROUP | SIK2, SRRM2, SRSF7 | ALPG 1549/4885PLAA 2619/4885ALPL 2535/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.