SCHEMBL13533362

SCHEMBL13533362

CC1CC2CC1CC2C(N)=O

nearest known ligand 0.45

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
▸ EPHX1 P07099 2/20 0.45

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29178205 0.85 EPHX1 (0.39) EPHX1
SCHEMBL22604587 0.80 EPHX1 (0.39) EPHX1
SCHEMBL22645802 0.79 GABRR1 (0.39) —
SCHEMBL10214195 0.79 GABRR1 (0.39) —
SCHEMBL13179065 0.76 CHRNB2 (0.39) —
SCHEMBL4351791 0.75 — —
SCHEMBL17382022 0.75 — —
SCHEMBL18998728 0.75 — —
SCHEMBL1636408 0.75 — —
SCHEMBL1706588 0.75 — —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8900789-B2 Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the composition FUJIFILM CORPORATION (JP) 2014-12-02 — — US disclosed
US-8900789-B2 Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the composition FUJIFILM CORPORATION (JP) 2014-12-02 — — US disclosed
US-20100015554-A1 ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN USING THE COMPOSITION FUJIFILM CORPORATION (JP) 2010-01-21 — — US disclosed
US-7255971-B2 Positive resist composition FUJIFILM CORPORATION (JP) 2007-08-14 — — US disclosed
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