SCHEMBL13535161

SCHEMBL13535161

O=C(NCCc1ccccc1)OCc1ccc(OCI)cc1

nearest known ligand 0.63

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
L3MBTL1 Q9Y468 2/20 0.63
MAPT P10636 2/20 0.63
SMN1; SMN2 Q16637 2/20 0.57
LMNA P02545 1/20 0.57
HTT P42858 1/20 0.55
TAAR1 Q96RJ0 3/20 0.52
NPC1 O15118 2/20 0.52
RAB9A P51151 2/20 0.52
GAA P10253 1/20 0.52
KMT2A Q03164 2/20 0.51
MEN1 O00255 1/20 0.51
FFAR1 O14842 1/20 0.50
FFAR4 Q5NUL3 1/20 0.50
GLA P06280 1/20 0.50
PTPN1 P18031 1/20 0.49
TGM2 P21980 1/20 0.49
BCHE P06276 1/20 0.49

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Benzyl Phenethylcarbamate SCHEMBL4287199 0.87 LMNA (0.73) L3MBTL1MAPTSMN1; SMN2LMNAHTT
SCHEMBL10447512 0.86 L3MBTL1 (0.59) L3MBTL1MAPTSMN1; SMN2LMNAHTT
SCHEMBL23291312 0.86 MAPT (0.66) L3MBTL1MAPTSMN1; SMN2LMNAHTT
SCHEMBL10447514 0.86 L3MBTL1 (0.59) L3MBTL1MAPTSMN1; SMN2LMNAHTT
SCHEMBL8737718 0.85 NPC1 (0.72) L3MBTL1MAPTSMN1; SMN2LMNATAAR1
SCHEMBL9331618 0.85 L3MBTL1 (0.58) L3MBTL1MAPTSMN1; SMN2LMNAHTT
SCHEMBL6554125 0.84 LMNA (0.65) L3MBTL1MAPTSMN1; SMN2LMNAHTT
SCHEMBL20497343 0.84 L3MBTL1 (0.63) L3MBTL1MAPTSMN1; SMN2LMNAHTT
Benzyl Phenethylcarbamate SCHEMBL6392045 0.83 LMNA (0.67) L3MBTL1MAPTSMN1; SMN2LMNAHTT
SCHEMBL6979935 0.83 GLA (0.67) L3MBTL1MAPTSMN1; SMN2LMNATAAR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20100015554-A1 ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN USING THE COMPOSITION FUJIFILM CORPORATION (JP) 2010-01-21 US disclosed