SCHEMBL1355167

SCHEMBL1355167

C=C(C)C(=O)OCC1C2CCC(C2)C1C

nearest known ligand 0.49

Predicted protein targets (top 6)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 3/20 0.49
TSHR P16473 4/20 0.38
THRB P10828 1/20 0.36
CYP3A4 P08684 1/20 0.32
CYP2D6 P10635 1/20 0.32
CYP2C19 P33261 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15154434 0.90 ALDH1A1 (0.55) ALDH1A1TSHRTHRBCYP3A4CYP2D6
SCHEMBL11703552 0.84 THRB (0.41) ALDH1A1TSHRTHRB
SCHEMBL11701834 0.83 ALDH1A1 (0.49) ALDH1A1TSHRTHRB
SCHEMBL11702201 0.81 TSHR (0.45) ALDH1A1TSHRTHRB
SCHEMBL23494023 0.79 ALDH1A1 (0.55) ALDH1A1TSHRTHRBCYP3A4CYP2D6
SCHEMBL14356441 0.77 ALDH1A1 (0.49) ALDH1A1TSHRTHRB
SCHEMBL10616126 0.77 ALDH1A1 (0.49) ALDH1A1TSHRTHRB
SCHEMBL19134529 0.76 ALDH1A1 (0.45) ALDH1A1TSHRTHRBCYP3A4CYP2D6
SCHEMBL465417 0.76 ALDH1A1 (0.51) ALDH1A1TSHRTHRBCYP3A4CYP2D6
SCHEMBL1061355 0.76 ALDH1A1 (0.51) ALDH1A1TSHRTHRB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 52 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3000784-B1 SILICA SOL AND SILICA-CONTAINING EPOXY RESIN COMPOSITION NISSAN CHEMICAL CORP (JP) 2020-07-15 EP disclosed
US-9969867-B2 Silica sol and silica-containing epoxy resin composition NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2018-05-15 US disclosed
EP-2527293-B1 SILANE SURFACE-TREATED METAL OXIDE FINE PARTICLES AND PRODUCTION METHOD FOR SAME. NISSAN CHEMICAL IND LTD (JP) 2017-10-25 EP disclosed
US-9527749-B2 Colloidal silica particles, process for producing the same, and organic solvent-dispersed silica sol, polymerizable compound-dispersed silica sol, and dicarboxylic anhydride-dispersed silica sol each obtained from the same NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2016-12-27 US disclosed
US-20160272843-A1 POLARIZING PLATE PROTECTIVE FILM, POLARIZING PLATE, LIQUID CRYSTAL DISPLAY DEVICE, AND METHOD FOR PREPARING POLARIZING PLATE PROTECTIVE FILM FUJIFILM CORPORATION (JP) 2016-09-22 US disclosed
US-9376322-B2 Process for producing colloidal silica particles NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2016-06-28 US disclosed
US-20160145110-A1 COLLOIDAL SILICA PARTICLES, PROCESS FOR PRODUCING THE SAME, AND ORGANIC SOLVENT-DISPERSED SILICA SOL, POLYMERIZABLE COMPOUND-DISPERSED SILICA SOL, AND DICARBOXYLIC ANHYDRIDE-DISPERSED SILICA SOL EACH OBTAINED FROM THE SAME NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2016-05-26 US disclosed
EP-3000784-A1 SILICA SOL AND SILICA-CONTAINING EPOXY RESIN COMPOSITION Nissan Chemical Industries, Ltd. (JP) 2016-03-30 EP disclosed
US-9284197-B2 Colloidal silica particles, process for producing the same, and organic solvent-dispersed silica sol, polymerizable compound-dispersed silica sol, and dicarboxylic anhydride-dispersed silica sol each obtained from the same NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2016-03-15 US disclosed
US-20160068664-A1 SILICA SOL AND SILICA-CONTAINING EPOXY RESIN COMPOSITION NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2016-03-10 US disclosed
EP-1091373-A1 Gel electrolyte for a photo-electrochemical cell Fuji Photo Film Co., Ltd. (JP) 2001-04-11 EP disclosed
EP-1089305-A2 Electrolyte composition, photoelectric conversion device and photo-electrochemical cell Fuji Photo Film Co., Ltd. (JP) 2001-04-04 EP disclosed
EP-1075005-A2 Electrolyte composition, and photo-electro-chemical cell FUJI PHOTO FILM CO., LTD. (JP) 2001-02-07 EP disclosed
EP-0973181-A1 Electrolyte, photoelectric conversion device and photoelectrochemical cell FUJI PHOTO FILM CO., LTD. (JP) 2000-01-19 EP disclosed
EP-0911841-A2 Photoelectric conversion device and photoelectrochemical cell Fuji Photo Film Co., Ltd. (JP) 1999-04-28 EP disclosed
US-5888719-A CONTINING A POLYMER; DARK DECAY STABILITY AGFA-GEVAERT AG (DE) 1999-03-30 US disclosed
US-5518877-A POLYPEPTIDE-ADDITION POLYMER AGFA-GEVAERT AG (DE) 1996-05-21 US disclosed
EP-0011481-B1 RUPTURABLE CONTAINERS FOR FLUIDS SUCH AS PHOTOGRAPHIC PROCESSING FLUIDS AND PHOTOGRAPHIC FILM UNITS INCLUDING SUCH CONTAINERS OF PROCESSING FLUIDS EASTMAN KODAK COMPANY (a New Jersey corporation) (US) 1982-11-03 EP disclosed
US-4188219-A ACRYLIC ESTER-ACRYLIC NORBRONYL ESTER COPOLYMERS, PHOTOGRAPHIC FILMS EASTMAN KODAK COMPANY (US) 1980-02-12 US disclosed
US-4054232-A CROSSLINKED 2-ACETOACETOXYETHYL METHACRYLATE HOMOPOLYMER OR COPOLYMER EASTMAN KODAK COMPANY (US) 1977-10-18 US disclosed