Triethylene Glycol

Triethylene Glycol

SCHEMBL135537

C=C(C)C(=O)OOC.OCCOCCOCCO

nearest known ligand 0.44

Full drug profile on Sugi Atlas →

Predicted protein targets (top 8)

geneUniProtsupporting neighboursconfidence
THRB P10828 2/20 0.44
MEN1 O00255 2/20 0.42
KMT2A Q03164 2/20 0.42
ALDH1A1 P00352 3/20 0.41
TSHR P16473 5/20 0.39
MAPK1 P28482 1/20 0.39
HTT P42858 1/20 0.35
MAPT P10636 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Tetraethylene Glycol SCHEMBL1831944 1.00 THRB (0.44) THRBMEN1KMT2AALDH1A1TSHR
Di(Hydroxyethyl)Ether SCHEMBL984519 0.98 ALDH1A1 (0.43) THRBMEN1KMT2AALDH1A1TSHR
Triethylene Glycol SCHEMBL15667224 0.95 THRB (0.41) THRBMEN1KMT2AALDH1A1TSHR
Ethylene Glycol SCHEMBL2905989 0.86 ALDH1A1 (0.50) THRBALDH1A1TSHR
SCHEMBL10595167 0.85 THRB (0.44) THRBMEN1KMT2AALDH1A1TSHR
SCHEMBL10592245 0.85 THRB (0.44) THRBMEN1KMT2AALDH1A1TSHR
Triethylene Glycol SCHEMBL2770781 0.84 ALDH1A1 (0.62) THRBMEN1KMT2AALDH1A1TSHR
SCHEMBL8625374 0.84 ALDH1A1 (0.62) THRBMEN1KMT2AALDH1A1TSHR
Pentaethylene Glycol SCHEMBL9580843 0.84 ALDH1A1 (0.62) THRBMEN1KMT2AALDH1A1TSHR
Tetraethylene Glycol SCHEMBL27952589 0.84 ALDH1A1 (0.62) THRBMEN1KMT2AALDH1A1TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 206 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2025085828-A1 SYSTEM AND METHOD FOR CONTROLLED POLYMER DEPOLYMERIZATION Intropic Materials Corporation (US) 2025-04-24 WO claimed
US-20250129391-A1 SYSTEM AND METHOD FOR CONTROLLED POLYMER DEPOLYMERIZATION Intropic Materials Corporation (US) 2025-04-24 US claimed
CN-111247609-B Conductive polymer dispersions for improved reliability 凯米特电子公司 2022-09-27 CN claimed
CN-111788237-B Acrylic rubber, acrylic rubber composition, crosslinked acrylic rubber, sealing material, and hose material 日本瑞翁株式会社 2022-06-14 CN claimed
CN-111247609-A Conductive polymer dispersions for improved reliability 凯米特电子公司 2020-06-05 CN claimed
US-12600885-B2 Composition including monomer with a carboxylic acid group, monomer with a hydroxyl group, an alkyl monomer, and crosslinker and related article and method 3M INNOVATIVE PROPERTIES COMPANY (US) 2026-04-14 US disclosed
CN-120999106-A Quasi-solid polymer electrolyte and preparation method and application thereof 南开大学 2025-11-21 CN disclosed
US-12393130-B2 Electrophotographic photosensitive member, process cartridge, and electrophotographic apparatus CANON KABUSHIKI KAISHA (JP) 2025-08-19 US disclosed
US-12378340-B2 Crosslinkers and curable compositions including the same 3M INNOVATIVE PROPERTIES COMPANY (US) 2025-08-05 US disclosed
WO-2025085828-A1 SYSTEM AND METHOD FOR CONTROLLED POLYMER DEPOLYMERIZATION Intropic Materials Corporation (US) 2025-04-24 WO disclosed
US-20250129391-A1 SYSTEM AND METHOD FOR CONTROLLED POLYMER DEPOLYMERIZATION Intropic Materials Corporation (US) 2025-04-24 US disclosed
EP-4526365-A1 ACRYLATE-EPOXY RESIN COMPOSITIONS Lyondellbasell Composites LLC (US) 2025-03-26 EP disclosed
EP-1197800-A1 Photosensitive composition FUJI PHOTO FILM CO., LTD. (JP) 2002-04-17 EP disclosed
US-20020018946-A1 Phosphor pattern, processes for preparing the same and photosensitive element to be used for the same NOJIRI TAKESHI (JP) 2002-02-14 US disclosed
US-6329111-B1 UNIFORM THICKNESS AND SHAPE ON THE WALL SURFACE OF A BARRIER RIB AND THE BOTTOM OF THE SPACE; SUBSTRATE HAS UNEVENNESS AND PHOSPHOR LAYER FORMED ON THE INNER SURFACE OF CONCAVE PORTION; FLAT PLATE MULTICOLOR PLASMA DISPLAY PANEL HITACHI CHEMICAL COMPANY (JP) 2001-12-11 US disclosed
US-6248501-B1 RESINS WITH CARBOXY GROUPS AND ETHYLENEIC UNSATURATED COMPOUNDS HITACHI CHEMICAL CO., LTD. (JP) 2001-06-19 US disclosed
US-6077647-A BACK PLATE FOR PLASMA DISPLAY PANEL HITACHI CHEMICAL CO., LTD. (JP) 2000-06-20 US disclosed
US-5858616-A Photosensitive resin composition, photosensitive film and process for preparing fluorescent pattern using the same, and phosphor subjected to surface treatment and process for preparing the same HITACHI CHEMICAL COMPANY, LTD. (JP) 1999-01-12 US disclosed
EP-0785565-A1 Phosphor pattern, processes for preparing the same and photosensitive element to be used for the same Hitachi Chemical Co., Ltd. (JP) 1997-07-23 EP disclosed
EP-0768573-A1 Phosphor-containing photosensitive resin composition for use in manufacturing plasma display panel Hitachi Chemical Co., Ltd. (JP) 1997-04-16 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-12600885-B2 Composition including monomer with a carboxylic acid group, monomer with a hydroxyl group, an alkyl monomer, and crosslinker and related article and method RAD51, HACL2, COL2A1 THRB 3014/4885MEN1 972/4885KMT2A 1580/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.