Predicted protein targets (top 5)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | DRD2 | P14416 | 1/20 | 0.32 |
| ▸ | SLC6A2 | P23975 | 1/20 | 0.32 |
| ▸ | HTR2A | P28223 | 1/20 | 0.32 |
| ▸ | HTR2C | P28335 | 1/20 | 0.32 |
| ▸ | SLC6A4 | P31645 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2308580 | 0.84 | TDP1 (0.33) | — | |
| SCHEMBL28150 | 0.83 | KDM4E (0.30) | — | |
| SCHEMBL4379538 | 0.80 | HTR2A (0.39) | DRD2SLC6A2HTR2AHTR2CSLC6A4 | |
| SCHEMBL3025234 | 0.75 | CYP1A2 (0.31) | — | |
| SCHEMBL6868808 | 0.74 | GABRA1 (0.33) | — | |
| SCHEMBL9496684 | 0.73 | — | — | |
| SCHEMBL11053479 | 0.72 | HTR2A (0.46) | DRD2SLC6A2HTR2AHTR2CSLC6A4 | |
| SCHEMBL11903157 | 0.72 | — | — | |
| SCHEMBL6043582 | 0.72 | — | — | |
| SCHEMBL2401855 | 0.71 | PNMT (0.34) | DRD2HTR2AHTR2C |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 23 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| JP-11269169-A | — | — | None | — | — | JP | disclosed |
| EP-4660705-A1 | NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING RELIEF PATTERN USING SAME, CURED ARTICLE AND ELECTRONIC COMPONENT | Toray Industries, Inc. (JP) | 2025-12-10 | — | — | EP | disclosed |
| WO-2024162116-A1 | NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING RELIEF PATTERN USING SAME, CURED ARTICLE AND ELECTRONIC COMPONENT | 東レ株式会社 | 2024-08-08 | — | — | WO | disclosed |
| US-20220155684-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN SHEET, METHOD FOR PRODUCING HOLLOW STRUCTURE, AND ELECTRONIC COMPONENT | TORAY INDUSTRIES, INC. (JP) | 2022-05-19 | — | — | US | disclosed |
| EP-3933906-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN SHEET, METHOD FOR PRODUCING HOLLOW STRUCTURE, AND ELECTRONIC COMPONENT | Toray Industries, Inc. (JP) | 2022-01-05 | — | — | EP | disclosed |
| CN-113646882-A | Photosensitive resin composition, photosensitive resin sheet, method for producing hollow structure, and electronic component | 东丽株式会社 | 2021-11-12 | — | — | CN | disclosed |
| CN-108885401-B | Photosensitive resin composition | 东丽株式会社 | 2021-06-01 | — | — | CN | disclosed |
| US-10948821-B2 | Photosensitive resin composition | TORAY INDUSTRIES, INC. (JP) | 2021-03-16 | — | — | US | disclosed |
| WO-2020196139-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN SHEET, METHOD FOR PRODUCING HOLLOW STRUCTURE, AND ELECTRONIC COMPONENT | 東レ株式会社 | 2020-10-01 | — | — | WO | disclosed |
| US-20190025697-A1 | PHOTOSENSITIVE RESIN COMPOSITION | TORAY INDUSTRIES, INC. (JP) | 2019-01-24 | — | — | US | disclosed |
| EP-2479779-A1 | PHOTOCURABLE TRANSFER SHEET, AND METHOD FOR FORMING RECESSED AND PROJECTED PATTERN USING SAME | Bridgestone Corporation (JP) | 2012-07-25 | — | — | EP | disclosed |
| US-20120175822-A1 | PHOTO-CURABLE TRANSFER SHEET AND METHOD FOR FORMING CONCAVE-CONVEX PATTERN USING THE SAME | BRIDGESTONE CORPORATION (JP) | 2012-07-12 | — | — | US | disclosed |
| US-20110278772-A1 | PHOTO-CURABLE TRANSFER SHEET AND METHOD FOR FORMING CONCAVE-CONVEX PATTERN USING THE SAME | BRIDGESTONE CORPORATION (JP) | 2011-11-17 | — | — | US | disclosed |
| EP-2381467-A1 | PHOTOCURABLE TRANSFER SHEET, AND METHOD FOR FORMING UNEVEN PATTERN USING SAME | Bridgestone Corporation (JP) | 2011-10-26 | — | — | EP | disclosed |
| US-20100047451-A1 | ACTINIC-RADIATION CURABLE INK COMPOSITION, INK SET, INK JET PRINTING APPARATUS, AND INK JET RECORDING METHOD USING ACTINIC-RADIATION CURABLE INK COMPOSITION | SEIKO EPSON CORPORATION | 2010-02-25 | — | — | US | disclosed |
| US-6054501-A | CURABILITY; GLOSSINESS; CAN BE BLENDED WITH INKS, PAINTS | NIPPON KAYAKU KABUSHIKI KAISHA (JP) | 2000-04-25 | — | — | US | disclosed |
| JP-H11269169-A | PRODUCTION OF SULFONIUM SALT | NIPPON KAYAKU CO LTD | 1999-10-05 | — | — | JP | disclosed |
| US-5821277-A | Thermosetting and procuring compositions for color filters and method for making the same | NIPPON OIL CO., LTD. (JP) | 1998-10-13 | — | — | US | disclosed |
| EP-0844255-A1 | PHOTOPOLYMERIZATION INITIATOR AND ACTINIC RADIATION-CURABLE COMPOSITION COMPRISING THE SAME | NIPPON KAYAKU KABUSHIKI KAISHA (JP) | 1998-05-27 | — | — | EP | disclosed |
| US-4450279-A | PHOTOPOLYMERIZATION SENSITIZERS FOR UNSATURATED MONOMERS; RAPID HARDENING; STORAGE STABILITY | NIPPON, KAYAKU, KABUSHIKI, KAISHA (JP) | 1984-05-22 | — | — | US | disclosed |