Predicted protein targets (top 2)
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1041269 | 0.84 | — | — | |
| SCHEMBL215978 | 0.84 | SLC6A2 (0.31) | — | |
| SCHEMBL4027300 | 0.84 | NPC1 (0.30) | — | |
| SCHEMBL9660668 | 0.83 | — | — | |
| SCHEMBL7158739 | 0.83 | SRC (0.31) | — | |
| SCHEMBL28150 | 0.82 | KDM4E (0.30) | — | |
| SCHEMBL2310833 | 0.81 | FFAR1 (0.30) | — | |
| SCHEMBL6139788 | 0.81 | TAAR1 (0.40) | — | |
| SCHEMBL166481 | 0.81 | PNMT (0.36) | GABRA1GABRB2 | |
| SCHEMBL1042696 | 0.78 | ALDH1A1 (0.32) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 32 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-110850678-B | Photosensitive compound, preparation method thereof, photosensitive compound composition and cured product thereof | 株式会社力森诺科 | 2024-03-15 | — | — | CN | claimed |
| US-6815140-B2 | COMPRISING A NOVOLAC RESIN, A RADIATION-SENSITIVE QUINONEDIAZIDE COMPOUND, AND ALSO A THIOXANTHONE COMPOUND TO IMPROVE RESOLUTION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2004-11-09 | — | — | US | claimed |
| US-20020006574-A1 | Comprising a novolac resin, a radiation-sensitive quinonediazide compound, and also a thioxanthone compound to improve resolution | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2002-01-17 | — | — | US | claimed |
| US-20010026905-A1 | Positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED | 2001-10-04 | — | — | US | claimed |
| EP-0962826-A1 | A positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1999-12-08 | — | — | EP | claimed |
| CN-116615332-B | Optically anisotropic laminate and optical element | MITSUBISHI CHEMICAL CORP. (JP) | 2026-05-26 | — | — | CN | disclosed |
| EP-4660705-A1 | NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING RELIEF PATTERN USING SAME, CURED ARTICLE AND ELECTRONIC COMPONENT | Toray Industries, Inc. (JP) | 2025-12-10 | — | — | EP | disclosed |
| CN-119948372-A | Optically anisotropic laminate and optical element | 三菱化学株式会社 | 2025-05-06 | — | — | CN | disclosed |
| WO-2024162116-A1 | NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING RELIEF PATTERN USING SAME, CURED ARTICLE AND ELECTRONIC COMPONENT | 東レ株式会社 | 2024-08-08 | — | — | WO | disclosed |
| WO-2024071162-A1 | OPTICALLY ANISOTROPIC LAMINATE AND OPTICAL ELEMENT | 三菱ケミカル株式会社 | 2024-04-04 | — | — | WO | disclosed |
| CN-110850678-B | Photosensitive compound, preparation method thereof, photosensitive compound composition and cured product thereof | 株式会社力森诺科 | 2024-03-15 | — | — | CN | disclosed |
| CN-116615332-A | Optically anisotropic laminate and optical element | 三菱化学株式会社 | 2023-08-18 | — | — | CN | disclosed |
| WO-2020196139-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN SHEET, METHOD FOR PRODUCING HOLLOW STRUCTURE, AND ELECTRONIC COMPONENT | 東レ株式会社 | 2020-10-01 | — | — | WO | disclosed |
| CN-111566560-A | Photosensitive resin composition, partition wall, organic electroluminescent element, image display device, and illumination | 三菱化学株式会社 | 2020-08-21 | — | — | CN | disclosed |
| US-20190025697-A1 | PHOTOSENSITIVE RESIN COMPOSITION | TORAY INDUSTRIES, INC. (JP) | 2019-01-24 | — | — | US | disclosed |
| US-6815140-B2 | COMPRISING A NOVOLAC RESIN, A RADIATION-SENSITIVE QUINONEDIAZIDE COMPOUND, AND ALSO A THIOXANTHONE COMPOUND TO IMPROVE RESOLUTION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2004-11-09 | — | — | US | disclosed |
| US-20020006574-A1 | Comprising a novolac resin, a radiation-sensitive quinonediazide compound, and also a thioxanthone compound to improve resolution | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2002-01-17 | — | — | US | disclosed |
| US-20010026905-A1 | Positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED | 2001-10-04 | — | — | US | disclosed |
| EP-0962826-A1 | A positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1999-12-08 | — | — | EP | disclosed |
| EP-0441221-A1 | Method for preventing the appearance of efflorescence of mineral substrates | BASF Aktiengesellschaft (DE) | 1991-08-14 | — | — | EP | disclosed |