SCHEMBL1357121

SCHEMBL1357121

CCC(OC[O])c1ccccc1

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LMNA P02545 4/20 0.43
ALDH1A1 P00352 2/20 0.41
IGLV6-57 P01721 1/20 0.38
POLB P06746 2/20 0.38
GSR P00390 1/20 0.38
CYP1A2 P05177 4/20 0.38
CYP2D6 P10635 4/20 0.38
KMT2A Q03164 3/20 0.37
SLC6A4 P31645 3/20 0.37
MEN1 O00255 2/20 0.37
HTT P42858 1/20 0.37
CYP3A4 P08684 4/20 0.37
CHRM1 P11229 2/20 0.37
TSHR P16473 2/20 0.37
ADRA2B P18089 2/20 0.37
SLC6A2 P23975 2/20 0.37
HTR2A P28223 2/20 0.37
HTR2C P28335 2/20 0.37
HRH1 P35367 2/20 0.37
OPRM1 P35372 2/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11363032 0.84 LMNA (0.41) LMNAALDH1A1IGLV6-57POLBGSR
SCHEMBL27389987 0.83 LMNA (0.46) LMNAALDH1A1POLBCYP1A2CYP2D6
SCHEMBL3408278 0.83 LMNA (0.46) LMNAALDH1A1POLBCYP1A2CYP2D6
SCHEMBL4871158 0.79 LMNA (0.43) LMNAALDH1A1CYP1A2CYP2D6KMT2A
SCHEMBL11593971 0.79 LMNA (0.48) LMNAALDH1A1POLBGSRKMT2A
SCHEMBL11379955 0.79 ALDH1A1 (0.44) LMNAALDH1A1IGLV6-57POLBGSR
SCHEMBL5038984 0.79 GLA (0.44) LMNAALDH1A1IGLV6-57POLBKMT2A
SCHEMBL5040797 0.79 LMNA (0.39) LMNAALDH1A1IGLV6-57POLBGSR
SCHEMBL2792023 0.78 LMNA (0.50) LMNAIGLV6-57POLBGSRSLC6A4
SCHEMBL36373 0.78 LMNA (0.50) LMNACYP1A2CYP2D6KMT2ASLC6A4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20110281040-A1 LIQUID CRYSTAL DISPLAY ELEMENT, POSITIVE TYPE RADIATION SENSITIVE COMPOSITION, INTERLAYER INSULATING FILM FOR LIQUID CRYSTAL DISPLAY ELEMENT, AND FORMATION METHOD THEREOF JSR CORPORATION (JP) 2011-11-17 US disclosed
US-7749678-B2 contains sulfonium compound; improved line edge roughness and pattern profile, and contrast of sensitivity and dissolution in extreme ultraviolet exposure FUJIFILM CORPORATION (JP) 2010-07-06 US disclosed
US-20050233242-A1 Photosensitive composition and pattern forming method using the same FUJI PHOTO FILM CO., LTD. 2005-10-20 US disclosed
EP-0793144-B1 Radiation sensitive composition JAPAN SYNTHETIC RUBBER CO LTD (JP) 2001-01-17 EP disclosed
US-5962180-A COMPRISING (A) A COPOLYMER COMPRISING RECURRING UNITS OF A P-HYDROXYSTYRENE UNIT AND A STYRENE UNIT HAVING AN ACETAL GROUP OR A KETAL GROUP AT THE P-POSITION, (B) A COPOLYMER COMPRISING RECURRING UNITS OF A T-BUTYL (METH)ACRYLATE UNIT JSR CORPORATION (JP) 1999-10-05 US disclosed
EP-0793144-A2 Radiation sensitive composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1997-09-03 EP disclosed