Predicted protein targets (top 18)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KCNA3 | P22001 | 1/20 | 0.50 |
| ▸ | LTA4H | P09960 | 2/20 | 0.48 |
| ▸ | CHRNB2 | P17787 | 2/20 | 0.47 |
| ▸ | CHRNB4 | P30926 | 2/20 | 0.47 |
| ▸ | CHRNA3 | P32297 | 2/20 | 0.47 |
| ▸ | CHRNA7 | P36544 | 2/20 | 0.47 |
| ▸ | CHRNA4 | P43681 | 2/20 | 0.47 |
| ▸ | PKM | P14618 | 2/20 | 0.46 |
| ▸ | HTR1B | P28222 | 2/20 | 0.46 |
| ▸ | LMNA | P02545 | 1/20 | 0.46 |
| ▸ | HTR1D | P28221 | 1/20 | 0.46 |
| ▸ | TAAR1 | Q96RJ0 | 1/20 | 0.45 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.45 |
| ▸ | RECQL | P46063 | 1/20 | 0.45 |
| ▸ | PTGER4 | P35408 | 1/20 | 0.44 |
| ▸ | PTGER2 | P43116 | 1/20 | 0.44 |
| ▸ | SIGMAR1 | Q99720 | 1/20 | 0.44 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.42 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14156843 | 0.95 | KCNA3 (0.45) | KCNA3LTA4HCHRNB2CHRNB4CHRNA3 | |
| SCHEMBL14064917 | 0.95 | KCNA3 (0.45) | KCNA3LTA4HCHRNB2CHRNB4CHRNA3 | |
| SCHEMBL14156844 | 0.95 | KCNA3 (0.45) | KCNA3LTA4HCHRNB2CHRNB4CHRNA3 | |
| SCHEMBL11696533 | 0.93 | LTA4H (0.61) | KCNA3LTA4HPKM | |
| SCHEMBL13599720 | 0.90 | CHRNB2 (0.51) | LTA4HCHRNB2CHRNB4CHRNA3CHRNA7 | |
| SCHEMBL14156848 | 0.87 | KCNA3 (0.50) | KCNA3LTA4HCHRNB2CHRNB4CHRNA3 | |
| SCHEMBL14156841 | 0.87 | KCNA3 (0.50) | KCNA3LTA4HCHRNB2CHRNB4CHRNA3 | |
| SCHEMBL14156840 | 0.85 | KCNA3 (0.48) | KCNA3LTA4HHTR1B | |
| SCHEMBL14156845 | 0.84 | KCNA3 (0.52) | KCNA3LTA4HCHRNB2CHRNB4CHRNA3 | |
| SCHEMBL14156842 | 0.84 | KCNA3 (0.52) | KCNA3LTA4HCHRNB2CHRNB4CHRNA3 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 19 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7629427-B2 | Block polymer compound, polymer composition containing the same, image forming method and image forming apparatus utilizing the same | CANON KABUSHIKI KAISHA (JP) | 2009-12-08 | — | — | US | disclosed |
| US-7601790-B2 | Amphiphilic block copolymer, polymer-containing composition containing the same, and method and apparatus for applying liquid using the polymer-containing composition | CANON KABUSHIKI KAISHA (JP) | 2009-10-13 | — | — | US | disclosed |
| US-7598332-B2 | Polymerizable compound, polymer compound, composition using the same, image-forming method, and image-forming apparatus | CANON KABUSHIKI KAISHA (JP) | 2009-10-06 | — | — | US | disclosed |
| US-20090226831-A1 | PHOTOCURABLE COATING COMPOSITION, AND OVERPRINT AND PROCESS FOR PRODUCING SAME | FUJIFILM CORPORATION (JP) | 2009-09-10 | — | — | US | disclosed |
| US-7585918-B2 | Block polymer compound, polymer-containing composition that contains the same | CANON KABUSHIKI KAISHA (JP) | 2009-09-08 | — | — | US | disclosed |
| US-7553884-B2 | Ink set for use in ink-jet recording, ink-jet recording process, recording unit and ink-jet recording apparatus | CANON KABUSHIKI KAISHA (JP) | 2009-06-30 | — | — | US | disclosed |
| US-7528180-B2 | Ink set for use in ink-jet recording, image forming process and image recording apparatus | CANON KABUSHIKI KAISHA (JP) | 2009-05-05 | — | — | US | disclosed |
| US-7498116-B2 | Resist composition and pattern formation method using the same | FUJIFILM CORPORATION (JP) | 2009-03-03 | — | — | US | disclosed |
| US-7491780-B2 | Polymerizable compound, polymer compound and block polymer compound, and composition, image-forming method and image-forming apparatus using the same | CANON KABUSHIKI KAISHA (JP) | 2009-02-17 | — | — | US | disclosed |
| US-7449513-B2 | Alkenyl ether compound, polymer compound, composition using them, and image formation method and apparatus | CANON KABUSHIKI KAISHA (JP) | 2008-11-11 | — | — | US | disclosed |
| US-7442485-B2 | Lithographic process involving on press development | FUJIFILM CORPORATION (JP) | 2008-10-28 | — | — | US | disclosed |
| US-7423075-B2 | Polymer, polymer-containing composition containing the same, ink composition, and ink applying method, image forming method and image forming apparatus which make use of ink composition | CANON KABUSHIKI KAISHA (JP) | 2008-09-09 | — | — | US | disclosed |
| US-7381759-B2 | Polymer composition, image-forming method and image-forming apparatus | CANON KABUSHIKI KAISHA (JP) | 2008-06-03 | — | — | US | disclosed |
| US-7378480-B2 | Polymerizable compound, polymer compound, composition using such compound, and image forming method and apparatus | CANON KABUSHIKI KAISHA (JP) | 2008-05-27 | — | — | US | disclosed |
| US-7368544-B2 | Polymerizable composition and planographic printing plate precursor using the same | FUJIFILM CORPORATION (JP) | 2008-05-06 | — | — | US | disclosed |
| US-7314698-B2 | Polymerizable composition and planographic printing plate precursor using the same | FUJIFILM CORPORATION (JP) | 2008-01-01 | — | — | US | disclosed |
| US-7300971-B2 | Particle composition, recording method, and recording apparatus using the particle composition | CANON KABUSHIKI KAISHA (JP) | 2007-11-27 | — | — | US | disclosed |
| US-20070063371-A1 | Production process and production apparatus of three-dimensionally structure material | CANON KABUSHIKI KAISHA (JP) | 2007-03-22 | — | — | US | disclosed |
| US-7157539-B2 | Polymerizable compound, polymer compound and block polymer compound, and composition, image-forming method and image-forming apparatus using the same | CANON KABUSHIKI KAISHA (JP) | 2007-01-02 | — | — | US | disclosed |