SCHEMBL13599720

SCHEMBL13599720

CCC(C)OCCOc1ccc(-c2ccccc2)cc1

nearest known ligand 0.54

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CHRNB2 P17787 1/20 0.51
CHRNB4 P30926 1/20 0.51
CHRNA3 P32297 1/20 0.51
CHRNA7 P36544 1/20 0.51
CHRNA4 P43681 1/20 0.51
LSS P48449 1/20 0.50
MAPT P10636 2/20 0.49
RAB9A P51151 4/20 0.47
MAPK1 P28482 1/20 0.47
LTA4H P09960 2/20 0.44
NPC1 O15118 3/20 0.43
HRH3 Q9Y5N1 2/20 0.43
CYP3A4 P08684 1/20 0.43
CYP2D6 P10635 1/20 0.43
CYP19A1 P11511 1/20 0.43
CYP2C9 P11712 1/20 0.43
CYP2C19 P33261 1/20 0.43
MMP3 P08254 1/20 0.43
PPARG P37231 2/20 0.43
PPARA Q07869 2/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13588495 0.90 KCNA3 (0.50) CHRNB2CHRNB4CHRNA3CHRNA7CHRNA4
SCHEMBL11696533 0.87 LTA4H (0.61) LTA4HPPARGPPARAPPARD
SCHEMBL14667596 0.85 SIGMAR1 (0.53) CHRNB2CHRNB4CHRNA3CHRNA7CHRNA4
SCHEMBL14461650 0.85 LSS (0.49) CHRNB2CHRNB4CHRNA3CHRNA7CHRNA4
SCHEMBL14156844 0.85 KCNA3 (0.45) CHRNB2CHRNB4CHRNA3CHRNA7CHRNA4
SCHEMBL14156843 0.85 KCNA3 (0.45) CHRNB2CHRNB4CHRNA3CHRNA7CHRNA4
SCHEMBL14064917 0.85 KCNA3 (0.45) CHRNB2CHRNB4CHRNA3CHRNA7CHRNA4
SCHEMBL18473510 0.84 ALOX5 (0.53) CHRNB2CHRNB4CHRNA3CHRNA7CHRNA4
SCHEMBL14118641 0.84 LSS (0.54) CHRNB2CHRNB4CHRNA3CHRNA7CHRNA4
SCHEMBL15295210 0.81 LSS (0.51) CHRNB2CHRNB4CHRNA3CHRNA7CHRNA4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8450393-B2 Polymeric compound containing composition, and image forming process and apparatus CANON KABUSHIKI KAISHA (JP) 2013-05-28 US disclosed
US-20090311425-A1 POLYMERIC COMPOUND CONTAINING COMPOSITION, AND IMAGE FORMING PROCESS AND APPARATUS CANON KABUSHIKI KAISHA (JP) 2009-12-17 US disclosed
US-7563853-B2 Polymer compound, process for producing the same, polymer-containing composition, ink-applying process, and ink-applying apparatus CANON KABUSHIKI KAISHA (JP) 2009-07-21 US disclosed
US-7528179-B2 Block polymer, polymer-containing composition containing the same, ink composition and liquid applying method and liquid applying apparatus utilizing the polymer-containing composition CANON KABUSHIKI KAISHA (JP) 2009-05-05 US disclosed
US-7442753-B2 Polymer compound and block polymer compound CANON KABUSHIKI KAISHA (JP) 2008-10-28 US disclosed