SCHEMBL13604236

SCHEMBL13604236

O=S(=O)(CCN1CCCCC1)c1ccccc1

nearest known ligand 0.71

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 4/20 0.71
MEN1 O00255 2/20 0.71
POLB P06746 2/20 0.53
SMN1; SMN2 Q16637 1/20 0.53
HTR7 P34969 2/20 0.52
LOX P28300 1/20 0.52
SIGMAR1 Q99720 2/20 0.50
LTA4H P09960 1/20 0.50
ALDH1A1 P00352 4/20 0.47
SLC6A3 Q01959 1/20 0.47
MAPK1 P28482 2/20 0.47
CYP2D6 P10635 1/20 0.47

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14476103 0.98 MEN1 (0.73) KMT2AMEN1POLBSMN1; SMN2HTR7
SCHEMBL10409579 0.84 SIGMAR1 (0.55) KMT2AMEN1POLBSMN1; SMN2HTR7
SCHEMBL10409520 0.84 SIGMAR1 (0.55) KMT2AMEN1POLBSMN1; SMN2HTR7
SCHEMBL18390001 0.84 MEN1 (0.69) KMT2AMEN1POLBSMN1; SMN2HTR7
SCHEMBL56319 0.83 LOX (0.57) KMT2AMEN1LOXALDH1A1MAPK1
SCHEMBL2921597 0.83 ESR1 (0.58) KMT2AMEN1POLBLOXSIGMAR1
SCHEMBL6245041 0.83 KMT2A (0.67) KMT2AMEN1POLBLOXSIGMAR1
SCHEMBL8412814 0.82 ESR1 (0.52) KMT2AMEN1POLBLOXALDH1A1
SCHEMBL10409586 0.82 SIGMAR1 (0.56) KMT2AMEN1POLBSMN1; SMN2HTR7
SCHEMBL16394281 0.81 POLB (0.56) KMT2AMEN1POLBSMN1; SMN2HTR7

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7635181-B2 Ink for ink jet-recording curable through irradiation with a radioactive ray and method for preparing lithographic printing plates using the same FUJIFILM CORPORATION (JP) 2009-12-22 US disclosed
US-7635181-B2 Ink for ink jet-recording curable through irradiation with a radioactive ray and method for preparing lithographic printing plates using the same FUJIFILM CORPORATION (JP) 2009-12-22 US disclosed
US-7306894-B2 Polymerizable composition, photopolymerizing method and process for producing lithographic printing plate using the polymerizable composition FUJIFILM CORPORATION (JP) 2007-12-11 US disclosed
US-7306894-B2 Polymerizable composition, photopolymerizing method and process for producing lithographic printing plate using the polymerizable composition FUJIFILM CORPORATION (JP) 2007-12-11 US disclosed