Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.46 |
| ▸ | KDM4E | B2RXH2 | 3/20 | 0.46 |
| ▸ | GAA | P10253 | 2/20 | 0.46 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.44 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.44 |
| ▸ | CYP1B1 | Q16678 | 1/20 | 0.44 |
| ▸ | HTR2A | P28223 | 1/20 | 0.43 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.43 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.42 |
| ▸ | CYP1A2 | P05177 | 4/20 | 0.42 |
| ▸ | MEN1 | O00255 | 3/20 | 0.42 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.42 |
| ▸ | CYP2C19 | P33261 | 3/20 | 0.42 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.42 |
| ▸ | GLA | P06280 | 1/20 | 0.42 |
| ▸ | HPGD | P15428 | 1/20 | 0.42 |
| ▸ | MAPT | P10636 | 1/20 | 0.42 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.42 |
| ▸ | ACP3 | P15309 | 1/20 | 0.41 |
| ▸ | ERBB2 | P04626 | 1/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29021078 | 0.98 | ALDH1A1 (0.44) | ALDH1A1KDM4EGAAHSD17B10HIF1A | |
| SCHEMBL29871049 | 0.91 | HTR2A (0.41) | ALDH1A1KDM4EHSD17B10HTR2AL3MBTL1 | |
| SCHEMBL1826097 | 0.91 | HTR2A (0.41) | ALDH1A1KDM4EHSD17B10HTR2AL3MBTL1 | |
| SCHEMBL11064339 | 0.85 | MC5R (0.44) | ALDH1A1KDM4EGAAHSD17B10HIF1A | |
| SCHEMBL8757955 | 0.85 | NPC1 (0.50) | MEN1KMT2AMAPTSMN1; SMN2LMNA | |
| SCHEMBL3407527 | 0.84 | CYP1A2 (0.48) | ALDH1A1KDM4EGAAHSD17B10HIF1A | |
| SCHEMBL11316967 | 0.84 | ALDH1A1 (0.44) | ALDH1A1KDM4EGAAHSD17B10HIF1A | |
| Methacrylic Acid SCHEMBL25408174 | 0.83 | TDP1 (0.42) | ALDH1A1KDM4EGAAHSD17B10L3MBTL1 | |
| SCHEMBL1456304 | 0.83 | ALDH1A1 (0.43) | ALDH1A1KDM4EGAAHSD17B10HIF1A | |
| SCHEMBL9858830 | 0.82 | ALDH1A1 (0.44) | ALDH1A1KDM4EGAAHSD17B10HIF1A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 914 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-118291044-A | Reversible acrylate adhesive with excellent secondary bonding strength, and preparation method, using method and application thereof | 郑州大学 | 2024-07-05 | — | — | CN | claimed |
| CN-118222171-A | Nanometer stamping adhesive for improving adhesive force of glass-based circuit and circuit manufacturing method based on glass substrate | 深圳市百柔新材料技术有限公司 | 2024-06-21 | — | — | CN | claimed |
| CN-113035408-B | Solar cell grid line slurry and preparation method thereof, and solar cell | 深圳市百柔新材料技术有限公司 | 2024-02-02 | — | — | CN | claimed |
| CN-114031544-B | Substituted maleimide fluorescent compound, and preparation and application thereof | 中山大学 | 2023-10-20 | — | — | CN | claimed |
| CN-116895750-A | Silicon-carbon negative electrode material with high cycle stability and preparation method and application thereof | 浙江锂宸新材料科技有限公司 | 2023-10-17 | — | — | CN | claimed |
| CN-114031736-B | Modified phenolic resin for photoresist, preparation method thereof and photoresist composition | 广东粤港澳大湾区黄埔材料研究院 | 2023-10-10 | — | — | CN | claimed |
| CN-115612056-A | High-toughness and high-mechanical-strength polyurethane elastomer with excellent water resistance and repairable and recyclable functions and preparation method thereof | 吉林大学 | 2023-01-17 | — | — | CN | claimed |
| CN-115073698-A | Photo-induced biodegradable shape memory material | 东北林业大学 | 2022-09-20 | — | — | CN | claimed |
| CN-114149297-A | Microwave-assisted green synthesis method of selective aryl formaldehyde | 北京中医药大学 | 2022-03-08 | — | — | CN | claimed |
| CN-114031736-A | Modified phenolic resin for photoresist, preparation method thereof and photoresist composition | 广东粤港澳大湾区黄埔材料研究院 | 2022-02-11 | — | — | CN | claimed |
| US-6187505-B1 | MIXTURE COMPRISING POLYSILSESQUIOXANE HAVING PHENOLIC GROUPS CROSSLINKABLE WITH ACID CATALYZABLE CURING AGENT, ACID GENERATOR, PHOTOSENSITIZER, A BASE AND SURFACTANT; PATTERN RESOLUTION WITH HIGH ASPECT RATIO | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2001-02-13 | — | — | US | claimed |
| EP-1048980-A1 | Bottom resist | Infineon Technologies AG (DE) | 2000-11-02 | — | — | EP | claimed |
| US-6103447-A | Approach to formulating irradiation sensitive positive resists | INTERNATIONAL BUSINESS MACHINES CORP. (US) | 2000-08-15 | — | — | US | claimed |
| EP-0543761-B1 | Crosslinkable aqueous developable photoresist compositions | IBM (US) | 2000-06-14 | — | — | EP | claimed |
| EP-0543762-B1 | Dry developable photoresist compositions and method for use thereof | IBM (US) | 2000-02-16 | — | — | EP | claimed |
| US-5514727-A | OPTICAL FIBER COATINGS, POLYETHER OR POLYESTER POLYOLS ENDCAPPED WITH HYDROXY VINYL ETHER | ALLIEDSIGNAL INC. (US) | 1996-05-07 | — | — | US | claimed |
| US-5322765-A | Dry developable photoresist compositions and method for use thereof | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 1994-06-21 | — | — | US | claimed |
| US-5296332-A | Crosslinkable aqueous developable photoresist compositions and method for use thereof | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 1994-03-22 | — | — | US | claimed |
| EP-0543761-A1 | Crosslinkable aqueous developable photoresist compositions and method for use thereof | International Business Machines Corporation (US) | 1993-05-26 | — | — | EP | claimed |
| EP-0543762-A1 | Dry developable photoresist compositions and method for use thereof | International Business Machines Corporation (US) | 1993-05-26 | — | — | EP | claimed |